Mobility of Helium and Nitrogen Implanted at High Fluences into Solids, as Derived from their Concentration Profiles
Abstract
It has recently been shown that the depth profiles of gases such as N and He broaden with increasing high fluence, after implantation into metals at high energies. Those depth profiles can be well simulated by an analytic approach, which assumes simultaneous implantation and radiation induced mobility of the implants. A universal relation is derived for the depth profile broadening as a function of the average implanted concentration. The comparison of simulated and measured distributions yields numerical values for the radiation induced diffusion coefficient of the implanted gas as a function of the fluence. Remarkable differences are found for both He and N mobilities. Measured changes of these depth profiles by thermal annealing are compared to results of a diffusion simulation program which includes trapping and detrapping at radiation induced defects. For all high fluence He and N implanted samples, the thermal gas mobility shows rapid onset at some specific temperatures, in contrast to samples implanted at low fluences. For He implanted systems, it was possible to identify several stages of gas release from He/defect clusters. The He and N depth profile shapes change with temperature in different manners, which may be understood by different atomistic migration mechanisms.
Keywords
Depth Profile High Fluence Profile Width Neutron Depth Profile Fluence DependencePreview
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References
- 1.J. R. Biersack and L. G. Haggmark, Nucl. Instr. Meth. 178, 257 (1980).CrossRefGoogle Scholar
- 2.J. P. Biersack, Z. Phys. A305, 95 (1982).ADSCrossRefGoogle Scholar
- 3.J. R. Biersack, Nucl. Instr. Meth. B35 205 (1988), and L. Wang, Thesis, Free University Berlin, 1990.CrossRefGoogle Scholar
- 4.D. Fink, Radiation Eff. 106, 231 (1988), and references therein.CrossRefGoogle Scholar
- 5.D. Fink, M. Mueller, L. Wang, J. Siegel, A. Vredenberg, J. Martan, and W. Fahrner, Radiation Effects and Defects in Solids, 115, 121 (1990), and references therein.CrossRefGoogle Scholar
- 6.B. Terreault, J. G. Martel, R. G. St. Jacques, G. Vieilleux, J. L. Ecuyer, C. Brussard, C. Cardinal, L. Dechenes, and P. L. Labrie, J. Nucl. Mat 63, 106 (1976) and>ADSCrossRefGoogle Scholar
- 6a.B. Terreault, G. Abel, J. G. Martel, R. G. StJacques, J. P. Labrie and J. L. Ecuyer, J. Nucl. Mater. 76/77, 249 (1978).ADSCrossRefGoogle Scholar
- 7.F. Paszti, personal communication and article in this volume.Google Scholar
- 8.P. Johnson, personal communication and article in this volume.Google Scholar
- 9.See, e. g. H. U. Jaeger, Solid State Phenomena, 1&2, 11 (1988) or RUJaeger, Nucl. Instr. Meth. B15, 748 (1986).CrossRefGoogle Scholar
- 10.D. Kaletta and J. Stubbins, J. Nucl. Mat. 74, 93 (1978).ADSCrossRefGoogle Scholar
- 11.P. Catterjee and A. K. Batabyal, Thin Solid Films 169, 79 (1989).ADSCrossRefGoogle Scholar
- 12.J. P. Biersack, D. Fink, R. Henkelmann and K. Mueller, Nucl. Instr. Meth. 149, 93 (1978).CrossRefGoogle Scholar
- 13.J. Ehrenberg, IPP 9140 (1982).Google Scholar
- 14.H. Ryssel, thesis, Technical University Muenchen (1973).Google Scholar
- 15.E. I. Zorin, P. V. Pavlov and D. I. Tetelbaum, Ionnoe Legirovanie Polprovodnikov, Ed. Energia, Moskva (1975) (in Russian).Google Scholar
- 16.J. P. Biersack, Radiation Eff. 19, 249 (1973).CrossRefGoogle Scholar
- 17.D. Fink, J. P. Biersack, K. Tjan and V. K. Cheng, Nucl. Instr. Meth. 194, 105 (1982).CrossRefGoogle Scholar
- 18.D. Fink, J. P. Biersack, M. Staedele and V. K. Cheng, Radiation Eff. 104, 1 (1987).CrossRefGoogle Scholar
- 19.H. Trinkaus, personal communication and article in this volume.Google Scholar
- 20.For a recent description, see: G. D. Smith, Numerical Solutions of Partial Differential Equations: Finite Difference Methods, 2nd. ed., Clarendon Press, Oxford (1978).Google Scholar
- 21.J. P. Biersack and D. Fink, in: Radiation Effects and Tritium Technology for Fusion Reactors, CONF-750989, Vol. II, p. 363 (1978), and Proc. Symp. Fus. Technol., 8th, 1974 (EUR 5182), p. 907.Google Scholar
- 22.J. P. Biersack and D. Fink, in: Ion Implantation in Semiconductors, S. Namba, ed., Plenum Publ. Corp., New York (1975) p. 211.CrossRefGoogle Scholar
- 23.The basic outline of this program was derived by J. P. Biersack, further details have been developed by K. Tjan and D. Fink. For a general description, see: K/Tjan, Thesis, Free University Berlin, Gemiany (1985) or L. Wang, Thesis, Free University Berlin, Germany (1990).Google Scholar
- 24.A. van Veen, personal communication and article in this volume.Google Scholar
- 25.J. Hirvonen and A. Antilla, Appl. Phys. Lett. 46, 835 (1985).ADSCrossRefGoogle Scholar
- 26.R. Hales and A. C. Hill, Metall. Soc. 7, 241 (1977).Google Scholar
- 27.V. Philips, Technische Hochschule Aachen, Germany, thesis (1980).Google Scholar