Atomic Collisions in Solids pp 141-157 | Cite as
Indication for an Ionization Damage Process in Light Ion Irradiation Damage in Silicon
Chapter
Abstract
Rutherford backscattering channeling experiments analysed in the framework of single scattering theory, taking into account the effects of flux peaking, lattice location of defects (through de-channeling cross section), and number of scattering centres per defect, indicate defect introduction rates for 300 keV H+ and 275 keV He+ in the ratio 1 to 2 which is similar to the electronic stopping power ratio but differs considerably from Kinchin and Pease predictions (ratio 1 to 20). A multiple ionization damage process is proposed.
Keywords
Ionization Cross Section Auger Recombination Yield Change Close Pair Random Path
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