Summary
Low loss EELS is a simple method which may be used to discriminate the polymorphs of nickel silicides: however, it has an energy resolution problem because of the instability of the hardware. This problem can be overcome by the use of the well-calibrated plasmon loss peak of Si and zero loss peak as references. We determined the low loss plasmon energies for each polymorph of nickel silicide within 0.1eV. The higher spatial resolution for discriminating three polymorphs of Ni silicide as narrow as 0.5nm can be obtained by using the branching ratio of the core loss EELS spectrum.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
Lauwers A, Steegen A, Potter M, Lindsay R, Satta A, Bender H and Maex K 2001 J. Vac. Sci. Technol. B19, 2026
Asayama K, Hashikawa N, Kawakami M, Yamaguchi T, Yonamoto Y and Mori H 2007 submitted to Jpn. J. Appl. Phys.
Sipr O and Ebert H 2005 Phys. Rev. B 72, 134406
Krivanek O L, Kundmann M K and Kimoto K 1995. J. Microsc. 180, 277
Cheynet M C and Pantel R 2005 International EELS Workshop, Grundlsee, Austria
Pearson D H, Fultz B and Ahn C C 1988 Appl. Phys. Lett. 53, 1405
Chen L J, Doland C M, Wu W, Chu J J and Lu S W 1987 J. Appl. Phys. 62, 2789
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2008 Springer Science+Business Media B.V.
About this paper
Cite this paper
Asayama, K., Hashikawa, N., Kawakami, M., Mori, H. (2008). High Accuracy and Resolution for the Separation of Nickel Silicide Polymorphs by Improved Analyses of EELS Spectra. In: Cullis, A.G., Midgley, P.A. (eds) Microscopy of Semiconducting Materials 2007. Springer Proceedings in Physics, vol 120. Springer, Dordrecht. https://doi.org/10.1007/978-1-4020-8615-1_72
Download citation
DOI: https://doi.org/10.1007/978-1-4020-8615-1_72
Publisher Name: Springer, Dordrecht
Print ISBN: 978-1-4020-8614-4
Online ISBN: 978-1-4020-8615-1
eBook Packages: Chemistry and Materials ScienceChemistry and Material Science (R0)