Resorcinol pp 717-732 | Cite as

Resorcinol Chemistry in Photoresist Technology

Chapter

Keywords

Silicon Wafer Negative Photoresist Positive Photoresist Novolac Resin Plasma Etching Process 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
This is a preview of subscription content, log in to check access.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    W. Moreau, Semiconductor Lithography: Principles, Practices and Materials, Plenum Press, New York (1988).Google Scholar
  2. 2.
    L. Thompson, C. Wilson and M. Bowden, Introduction to Microlithography, ACS Symposium Series (1983).Google Scholar
  3. 3.
    Photolithography, Texas Engineering Extension Services (2000).Google Scholar
  4. 4.
    www.ee.gatech.edu/research/labs/vc/graphics/photolith/plithp1.gif. Cited 21 July (2004).Google Scholar
  5. 5.
    Wilson Research Group, Photomask Lithography — University of Texas at Austin, TX (2000).Google Scholar
  6. 6.
    A. Jeffries, A. Blakeney and M. Toukhy, US Patent, 4,992,596 (1991).Google Scholar
  7. 7.
    Y. Hosaka et al., US Patent, 5,087,548 (1992).Google Scholar
  8. 8.
    L. Bogan, Euro. Patent Appln., 0,435,502 A1 (1990).Google Scholar
  9. 9.
    A. Blakeney, A. Jeffries and T. Sarubbi, US Patent, 4,837,121 (1989).Google Scholar
  10. 10.
    A. Blakeney, A. Jeffries and T. Sarubbi, US Patent, 4,970,287 (1990).Google Scholar
  11. 11.
    A. Blakeney, A. Jeffries and T. Sarubbi, US Patent, 5,024,921 (1991).Google Scholar
  12. 12.
    Y. Uetani et al., U.S Patent, 5,124,228 (1992).Google Scholar
  13. 13.
    Y. Uetani and H. Nakanishi, US Patent, 5,290,657 (1994).Google Scholar
  14. 14.
    Y. Uetani, H. Nakanishi and Y. Doi, US Patent, 5,283,155 (1994).Google Scholar
  15. 15.
    Y. Doi et al., Euro. Patent, 0,510,671 B1 (1992).Google Scholar
  16. 16.
    Y. Uetani, J. Tomioka and S. Lee, US Patent, 6,383,709 (2002).Google Scholar
  17. 17.
    H. Iida et al., US Patent Appln., 2003/0,175,613 (2003).Google Scholar
  18. 18.
    A. Jeffries, A. Blakeney and M. Toukhy, US Patent, 4,957,846 (1990).Google Scholar
  19. 19.
    A. Jeffries, A. Blakeney and M. Toukhy, US Patent, 4,992,356 (1991).Google Scholar
  20. 20.
    A. Zampini and H. Sanford, US Patent, 6,051,358 (2000).Google Scholar
  21. 21.
    K. Inomata, M. Akiyama, S. Iwanaga and A. Tsuji, US Patent, 6,007,961 (1999).Google Scholar
  22. 22.
    K. Inomata, K. Douki, T. Mizumachi and I. Iwanaga. US Patent, 6,171,750 (2001).Google Scholar
  23. 23.
    P. Trefonas, A. Zampini and D. Madoux, US Patent, 4,983,492 (1991).Google Scholar
  24. 24.
    P. Trefonas, A. Zampini and D. Madoux, US Patent, 5,164,279 (1992).Google Scholar
  25. 25.
    H. Ito, T. Nakayama and M. Ueda, US Patent, 6,093,517 (2000).Google Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 2005

Personalised recommendations