Block Copolymers II pp 183-226

Part of the Advances in Polymer Science book series (POLYMER, volume 190)

Patternable Block Copolymers

  • Mingqi Li
  • Christopher A. Coenjarts
  • Christopher K. Ober
Chapter

Abstract

This article is a review of the chemical and physical nature of patternable block copolymers and their use as templates for functional nanostructures. The patternability of block copolymers, that is, the ability to make complex, arbitrarily shaped submicron structures in block copolymer films, results from both their ability to self-assemble into microdomains, the “bottom-up” approach, and the manipulation of these patterns by a variety of physical and chemical means including “top-down” lithographic techniques. Procedures for achieving long-range control of microdomain pattern orientation as well as the combination of top-down and bottom-up patterning to give multilevel control of block copolymer films are extensively discussed. The level of control over patterning block copolymers that these strategies afford has enabled recent developments in nanofabrication including template nanolithography, template nanoparticle patterning, nanoporous as well as nanoreplicated materials.

Review Patternable Block copolymer Microdomain Orientation Nanofabrication 

Abbreviations

1D

One dimensional

2D

Two dimensional

3D

Three dimensional

BA

Benzoic acid

CPS

Close-packed spheres

C

Cylinder

G

Gyroid

L

Lamellae

OTS

Octadecyltrichlorosilane

PαMS

Poly(α-methylstyrene)

P2VP

Poly(2-vinylpyridine)

PAG

Photoacid generator

PBMA

Poly(butylmethacrylate)

PB

Poly(butadiene)

PDMS

Poly(dimethylsiloxane)

PEO

Poly(ethylene oxide)

PETS

Phenylethyltrichlorosilane

PE

Polyethylene

PFS

Poly(ferrocenyl dimethylsilane)

PHS

Poly(4-hydroxystyrene)

PI

Polyisoprene

PMMA

Poly(methylmethacrylate)

PMS

Poly(para-methylstyrene)

PS

Polystyrene

SAM

Self-assembled monolayer

SBS

Poly(styrene-b-butadiene-b-styrene)

SEBS

Poly(styrene-b-ethylene butylene-b-styrene)

S

Sphere

-b-

-Block-

-r-

-Random-

fA

Volume ratio

L0

Natural period of block copolymers

t

Film thickness

χ

Flory--Huggins parameter

T

Temperature gradient

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Authors and Affiliations

  • Mingqi Li
    • 1
  • Christopher A. Coenjarts
    • 1
  • Christopher K. Ober
    • 1
  1. 1.Department of Materials Science and EngineeringCornell UniversityIthacaUSA

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