Thin Nitride Films Deposited by Reactive Pulsed Laser Ablation

  • Armando Luches
  • Anna Paola Caricato
Chapter

Abstract

This chapter reviews the work done in our laboratory and others on synthesis and deposition of thin films of metal nitrides, using the reactive pulsed laser ablation (RPLD) technique. In particular, thin films deposition of transition-metal nitride e.g. TiN and VN, aluminum AlN and boron nitride BN films are detailed. The characteristics of the fabricated films are presented as a function of the deposition parameters, to explain their role and give useful information for the development and application of this innovative deposition technique.

Keywords

Boron Nitride Laser Fluence Nitride Film Vanadium Nitride Thin Nitride Film 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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Copyright information

© Kluwer Academic Publishers 2003

Authors and Affiliations

  • Armando Luches
    • 1
  • Anna Paola Caricato
    • 1
  1. 1.Dipartimento di Fisica and Istituto Nazionale per la Fisica della MateriaUniversità di LecceLecceItaly

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