Abstract
Laser heat-mode lithography is useful for obtaining arbitrary micro/nanostructures on the heat-mode resist thin films. In real applications, the micro/nanostructures need to be further transferred to the substrates, such as silicon, quartz, or sapphires. The optical/electronic elements and devices can be also obtained through the pattern transfer techniques.
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Wei, J. (2019). Pattern Transfer for Laser Heat-Mode Lithography. In: Laser Heat-Mode Lithography. Springer Series in Materials Science, vol 291. Springer, Singapore. https://doi.org/10.1007/978-981-15-0943-8_9
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DOI: https://doi.org/10.1007/978-981-15-0943-8_9
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