Abstract
Due to their technological importance, III–V compound semiconductors have been widely studied. While extensive work has been done on their geometric and electronic structure, Kelvin probe force microscopy (KPFM) in ultrahigh vacuum (UHV) creates the possibility to study the electronic structure of the surfaces on a nanometer scale [1]. The work function is one of the most important values characterizing the property of a surface. Chemical and physical phenomena taking place at the surface are strongly affected by the work function. In turn, the work function variation reflects physical and chemical changes of surface conditions [2]. For example, due to a localized dipole at atomic steps, the averaged work function on a metal surface decreases in proportion to the step density [3]. If molecules or atoms are adsorbed on a surface, the work function changes depending on the magnitude of the electric dipole formed by the adsorbates [2]. Although the work function is defined as a macroscopic concept, it is necessary to consider its microscopic local variations in understanding the details of the formation of semiconductor interfaces and device behavior.
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References
J. M. R. Weaver and D. W. Abraham J. Vac. Sci. Technol. B 9(3), 1559 (1991).
H. Lüth, Surfaces and Interfaces of Solid Materials, 3rd edn. (Springer, 1995).
K. Besocke, B. Krahl-Urban, and H. Wagner, Surface Science 68, 39 (1977).
C. C. Williams, Annual Review of Materials Science 29, 471 (1999).
P. De Wolf, M. Geva, T. Hantschel, W. Vandervorst, and R. B. Bylsma, Appl. Phys. Lett. 73, 2155 (1998).
K. Maknys, O. Douheret, and S. Anand, Appl. Phys. Lett. 83, 4205 (2001).
K. Maknys, O. Douheret, and S. Anand, Appl. Phys. Lett. 83, 2184 (2001).
O. Douheret, S. Anand, Th. Glatzel, K. Maknys, and S. Sadewasser, Appl. Phys. Lett. 85, 5245 (2004).
Ph. Ebert, Xun Chen, M. Heinrich, M. Simon, K. Urban, and M. G. Lagally, Phys. Rev. Lett. 76, 2089 (1996).
Ph. Ebert, M. Heinrich, M. Simon, C. Domke, K. Urban, C. K. Shih, M. B. Webb, and M. G. Lagally, Phys. Rev. B 53, 4580 (1996).
Ph. Ebert, P. Quadbeck, K. Urban, B. Henninger, K. Horn, G. Schwarz, J. Neugebauer, and M. Scheffler, Appl. Phys. Lett. 79, 2877 (2001).
M. Heinrich, C. Domke, Ph. Ebert, and K. Urban, Phys. Rev. B 53, 10894 (1996).
Ch. Sommerhalter, Th. W. Matthes, Th. Glatzel, A. Jäger-Waldau, and M. Ch. Lux-Steiner, Appl. Phys. Lett. 75, 286 (1999).
Th. Glatzel, S. Sadewasser, R. Shikler, Y. Rosenwaks, and M.Ch. Lux-Steiner, Mat. Sci. Engineer. B 102, 138 (2003).
Y. Rosenwaks, R. Shikler, Th. Glatzel, and S. Sadewasser, Phys. Rev. B 70, 085320 (2004).
A. Huijser, J. van Laar, and T. L. van Rooy, Surface Science 62, 472 (1977).
J. van Laar, A. Huijser, and T. L. van Rooy, Journal of Vacuum Science and Technology 14, 894 (1977).
H. O. Jacobs, P. Leuchtmann, O. J. Homan, and A. Stemmer, J. Appl. Phys. 84, 1168 (1998).
S. Belaidi, P. Girard, and G. Leveque, J. Appl. Phys. 81, 1023 (1997).
A. Schwarzman, E. Grunbaum, E. Strassburg, E. Lepkifker, A. Boag, Th. Glatzel, Z. Barkay, M. Mazzer, K. Barnham, and Y. Rosenwaks, J. Appl. Phys. 98, 84310 (2005).
N. J. Ekins-Daukes, J. M. Barnes, K. W. J. Barnham, J. P. Connolly, M. Mazzer, J. C. Clark, R. Grey, G. Hill, M. A. Pate, and J. S. Roberts, Solar Energy Materials and Solar Cells 68, 71 (2001).
K. W. J. Barnham, P. Abbott, I. Ballard, D. B. Bushnell, J. P. Connolly, N. J. Ekins-Daukes, M. Mazzer, J. Nelson, C. Rohr, T. Tibbits, R. Airey, G. Hill, and J. S. Roberts, Proc. 3rd World Conference on Photovoltaic Energy Conversion (Osaka, Japan, 2003).
K. W. J. Barnham, I. Ballard, J. G. Connolly, N. Ekins-Daukes, B. G. Kluftinger, J. Nelson, C. Rohr, and M. Mazzer, J. Mat. Sci.: Mat. Elec. 11, 531 (2000).
K. W. J. Barnham, I. Ballard, J. P. Connolly, N. J. Ekins-Daukes, B. G. Kluftinger, J. Nelson, and C. Rohr, Physica E 14, 27 (2002).
Z. Barkay, E. Grünbaum, Y. Shapira, Inst. Phys. Conf. Ser. 179, 143 (2003).
R. Klenk, Thin Solid Films 387, 135 (2001).
C.-S. Jiang, F. S. Hasoon, H. R. Moutinho, H. A. Al-Thani, M. J. Romero, and M. M. Al-Jassim, Appl. Phys. Lett. 82, 127 (2003).
C.-S. Jiang, R. Noufi, J. A. AbuShama, K. Ramanathan, H. R. Moutinho, J. Pankow, and M. M. Al-Jassim, Appl. Phys. Lett. 84, 3477 (2004).
C.-S. Jiang, R. Noufi, K. Ramanathan, J. A. AbuShama, H. R. Moutinho, and M. M. Al-Jassim, Appl. Phys. Lett. 85, 2625 (2004).
Th. Glatzel, S. von Roon, S. Sadewasser, R. Klenk, A. Jäger-Waldau, and M. Ch. Lux-Steiner, Proc. 17th EPVSEC, Munich, Germany, p. 1151 (2001).
Th. Glatzel, and D. Fuertes Marron, Th. Schedel-Niedrig, S. Sadewasser, and M. Ch. Lux-Steiner, Appl. Phys. Lett. 81, 2017 (2002).
Th. Glatzel, H. Steigert, R. Klenk, M. Ch. Lux-Steiner, T. P. Niesen, and S. Visbeck, Technical Digest of the 14th Photovoltaic Solar Energy Conference PVSEC, vol. 2, p. 707 (Bangkok, Thailand, 2004).
D. Fuertes Marrón, Th. Glatzel, A. Meeder, Th. Schedel-Niedrig, S. Sadewasser, and M. Ch. Lux-Steiner, Appl. Phys. Lett. 85(17), 3755–3757 (2004).
D. Fuertes Marrón, S. Sadewasser, A. Meeder, Th. Glatzel, and M. Ch. Lux-Steiner, Phys. Rev. B, 17(2) 033306 (2005).
S. Sadewasser, Th. Glatzel, M. Rusu, A. Meeder, D. Fuertes Marrón, A. Jäger-Waldau, and M. Ch. Lux-Steiner, Mat. Res. Soc. Symp. Proc. Vol. 668, p. H5.4.1 (2001).
S. Sadewasser, Th. Glatzel, M. Rusu, A. Jäger-Waldau, and M. Ch. Lux-Steiner, Proc. of the 17th Photovoltaic Solar Energy Conf., Munich, Germany, p. 1155 (2001).
S. Sadewasser, Th. Glatzel, M. Rusu, A. Jäger-Waldau, and M. Ch. Lux-Steiner, Appl. Phys. Lett. 80, 2979 (2002).
S. Sadewasser, Th. Glatzel, S. Schuler, S. Nishiwaki, R. Kaigawa, and M. Ch. Lux-Steiner, Thin Solid Films 431–432, 257 (2003).
Ch. Sommerhalter, S. Sadewasser, Th. Glatzel, Th. W. Matthes, A. Jäger-Waldau, and M. Ch. Lux-Steiner, Surf. Sci. 482–485, 1362 (2001).
G. Hanna, Th. Glatzel, S. Sadewasser, N. Ott, H. P. Strunk, U. Rau, and J. H. Werner, accepted Appl. Phys. A.
L. Kronik, L. Burstein, M. Leibovitch, Y. Shapira, D. Gal, E. Moons, J. Beier, G. modes, D. Cahen, D. Hariskos, R. Klenk, and H.-W. Schock, Appl. Phys. Lett. 67, 1405 (1995).
M. A. Contreras, B. Egaas, K. Ramanathan, J. Hiltner, A. Swartzlander, F. Hasoon, and R. Noufi, Progr. Photovolt. 7, 311 (1999).
A. Klein, T. Loher, C. Pettenkofer, and W. Jägermann J. Appl. Phys. 80, 5039 (1996).
Th. Glatzel, H. Steigert, S. Sadewasser, R. Klenk, and M. Ch. Lux-Steiner, Thin Solid Films 480–481, 177–182 (2005).
D. Fuertes Marrón, A. Meeder, S. Sadewasser, R. Würz, C. A. Kaufmann, Th. Glatzel, Th. Schedel-Niedrig, and M. Ch. Lux-Steiner, J. Appl. Phys. 97, 094915 (2005).
W. Mönch, Semiconductor Surfaces and Interfaces, Springer-Verlag, Berlin, 1993.
V. V. Zavyalov, J. S. McMurray, and C. C. Williams, J. Appl. Phys. 85, 7774 (1999).
J. Yang, and F. C. Kong, J. App. Phys. Lett. 81, 4973 (2002).
P. Eyben, M. Xu, N. Duhayon, T. Clarysse, S. Callewaert, W. Vandervorst, and J. Vac. Sci. Tech. B 20, 471 (2002).
For a comprehensive review of surface photovoltage phenomena see L. Kronik, Y. Shapira, Surf. Sci. Rep. 37, 1 (1999).
S. Selberherr, Analysis and Simulation of Semiconductor Devices, Springer-Verlag, New York-Wien (1984).
R. Williams, J. Phys. Chem. Solids 23, 1057 (1962).
A. Vilan, A. Shanzer, and D. Cahen, Nature 404, 166 (2000).
A. A. Asuha, O. Maida, Y. Todokoro, and H. Kobayashi, Appl. Phys. Lett. 80, 4552 (2002).
A. Nitzan and M. A. Ratner, Science 300, 1384 (2003).
N. P. Guisinger, M. E. Greene, R. Basu, A. S. Baluch, and M. C. Hersam, Nano Lett. 4, 55 (2004).
E. H. Nicollian and J. R. Brews, MOS Physics and Technology (John Wiley & Sons, 1982).
L. Kronik, L. Burstein, and Y. Shapira, Appl. Phys. Lett. 63, 60 (1993).
R. J. Hamers, Ann. Rev. Phys. Chem. 40, 531 (1989).
S. Saraf and Y. Rosenwaks, Surface Science Letters 574, L35 (2005).
R. Shikler, T. Meoded, N. Fried, and Y. Rosenwaks, Appl. Phys. Lett. 74, 2972 (1999).
H. Flietner, Surface Science 200, 463 (1988).
W. Fussel, M. Schmidt, H. Angermann, G. Mende, and H. Flietner, Nuclear Instruments and Methods in Physics Research A 377, 177 (1996).
E. H. Poindexter, G. J. Gerardi, M. E. Rucckel, P. J. Caplan, N. M. Johnson, and D. K. Bregelsen, J. Appl. Phys. 56, 2844 (1984).
R. Shikler, T. Meoded, N. Fried, and Y. Rosenwaks, Phys. Rev. B 61, 11041 (2000).
R. Shikler, T. Meoded, N. Fried, and Y. Rosenwaks, J. Appl. Phys. 86, 107 (1999).
L. Burgi, T. J. Richards, R. H. Friend, and H. Sirringhaus, J. Appl. Phys. 94, 6129, (2003).
L. Burgi, H Sirringhaus, and R. H. Friend, Appl. Phys. Lett. 80, 2913 (2002).
G. Paasch, H. Peisert, M. Knupfer, J. Fink, and S. Scheinert, J. Appl. Phys. 93, 6084 (2003).
A. Kahn, N. Koch, and G. Weiying, J. Poly. Sci. B. 41, 2529 (2003).
H. Ishii, K. Sugiyama, E. Ito, and K. Seki, Adv. Mat. 11, 605 (1999).
H. Ishii and K. Seki, IEEE Trans. Electron Devices 44, 1295 (1997).
W. D. Grobman and E. E. Koch, Photoemission in Solids, Vol. 2 (Eds: L. Ley, M. Cardona), Springer, Berlin, 261 (1979).
K. Seki, H. Oji, N. Hayashi, Y. Ouchi, and H. Ishii, Proc. SPIE 3797, 178 (1999).
Except for the AFM feedback laser, which operates at 1.85 eV, smaller then the optical gap of Alq3 (∼3.2 eV) but larger than the metal/Alq3 barriers. Sample illumination was minimized by tip shielding and reducing the laser intensity; no changes in CPD were observed using different laser intensities.
C. Shen and A. Kahn, Organic Electronics 2, 89 (2001).
S. C. Jr. Fain, L. V. Corbin II, and J. M. McDavid, Rev of Sci. Ins. 47, 345 (1976).
J. M. Heras and E. V. Albano, Zeitschrift fur Physikalische Chemie Neue Folge, 129, 11 (1982).
I. G. Hill, A. Kahn, Z. G. Soos, and R. A. Jr. Pascal, Chem. Phys. Let. 327, 3, (2000).
A. Rajagopal, C. I. Wu, and A. Kahn, J. Appl. Phys. 83, 2649 (1998).
S. Belaidi, F. Lebon, P. Girard, G. Leveque, and S. Pagano, Appl. Phys. A 66, S239 (1998).
S. Hudlet, M. Saint Jean, B. Roulet, J. Berger, and C. Guthmann, J. Appl. Phys. 59, 3308 (1995).
S. Karg, J. Steiger, and H. von Seggern, Synthetic Metals 111, 277 (2000).
N. Hayashi, H. Ishii, Y. Ouchi, and K. Seki, J. Appl. Phys. 92, 3784, (2002).
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Rosenwaks, Y., Saraf, S., Tal, O., Schwarzman, A., Glatzel, T., Lux-Steiner, M.C. (2007). Kelvin Probe Force Microscopy of Semiconductors. In: Kalinin, S., Gruverman, A. (eds) Scanning Probe Microscopy. Springer, New York, NY. https://doi.org/10.1007/978-0-387-28668-6_25
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DOI: https://doi.org/10.1007/978-0-387-28668-6_25
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