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Patternable Block Copolymers

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Book cover Block Copolymers II

Part of the book series: Advances in Polymer Science ((POLYMER,volume 190))

Abstract

This article is a review of the chemical and physical nature of patternable block copolymers and their use as templates for functional nanostructures. The patternability of block copolymers, that is, the ability to make complex, arbitrarily shaped submicron structures in block copolymer films, results from both their ability to self-assemble into microdomains, the “bottom-up” approach, and the manipulation of these patterns by a variety of physical and chemical means including “top-down” lithographic techniques. Procedures for achieving long-range control of microdomain pattern orientation as well as the combination of top-down and bottom-up patterning to give multilevel control of block copolymer films are extensively discussed. The level of control over patterning block copolymers that these strategies afford has enabled recent developments in nanofabrication including template nanolithography, template nanoparticle patterning, nanoporous as well as nanoreplicated materials.

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Abbreviations

1D:

One dimensional

2D:

Two dimensional

3D:

Three dimensional

BA:

Benzoic acid

CPS:

Close-packed spheres

C:

Cylinder

G:

Gyroid

L:

Lamellae

OTS:

Octadecyltrichlorosilane

PαMS:

Poly(α-methylstyrene)

P2VP:

Poly(2-vinylpyridine)

PAG:

Photoacid generator

PBMA:

Poly(butylmethacrylate)

PB:

Poly(butadiene)

PDMS:

Poly(dimethylsiloxane)

PEO:

Poly(ethylene oxide)

PETS:

Phenylethyltrichlorosilane

PE:

Polyethylene

PFS:

Poly(ferrocenyl dimethylsilane)

PHS:

Poly(4-hydroxystyrene)

PI:

Polyisoprene

PMMA:

Poly(methylmethacrylate)

PMS:

Poly(para-methylstyrene)

PS:

Polystyrene

SAM:

Self-assembled monolayer

SBS:

Poly(styrene-b-butadiene-b-styrene)

SEBS:

Poly(styrene-b-ethylene butylene-b-styrene)

S:

Sphere

-b-:

-Block-

-r-:

-Random-

f A :

Volume ratio

L 0 :

Natural period of block copolymers

t :

Film thickness

χ:

Flory--Huggins parameter

T :

Temperature gradient

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Acknowledgments

The research reported here was supported by the Nanobiotechnogy Center (NBTC), an STC Program of the National Science Foundation under Agreement No. ECS-9876771. We also thanks the Cornell Center for Materials Research (CCMR) and Cornell Nanofabrication Center (CNF) for use of their facilities.

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Correspondence to Christopher K. Ober .

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Volker Abetz

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Li, M., Coenjarts, C.A., Ober, C.K. Patternable Block Copolymers. In: Abetz, V. (eds) Block Copolymers II. Advances in Polymer Science, vol 190. Springer, Berlin, Heidelberg. https://doi.org/10.1007/12_003

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