Ion Implantation: Equipment and Techniques

Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982

  • Heiner Ryssel
  • Hans Glawischnig

Part of the Springer Series in Electrophysics book series (SSEP, volume 11)

Table of contents

  1. Front Matter
    Pages I-X
  2. Ion Implanters

    1. Front Matter
      Pages 1-1
    2. K. Tokiguchi, H. Itoh, N. Sakudo, H. Koike, T. Warabisako, T. Saitoh et al.
      Pages 25-30
    3. M. D. Nahemow, R. E. Fromson, R. Kossowsky, J. L. Pack
      Pages 31-36
    4. P. L. F. Hemment, J. E. Mynard, E. Pásztor, C. J. Richmond, K. G. Stephens
      Pages 37-44
    5. N. J. Barrett
      Pages 45-53
  3. Ion Sources

    1. Front Matter
      Pages 55-55
    2. E. Pásztor, L. Királyhidi
      Pages 59-62
    3. R. Keller, F. Nöhmayer, P. Spädtke
      Pages 79-85
    4. W. B. Thompson, I. Honjo, N. Turner
      Pages 86-96
    5. A. Latuszyński, D. Maczka, Yu. V. Yushkievich
      Pages 106-112
  4. Implanter Subsystems

    1. Front Matter
      Pages 113-113
    2. N. Turner
      Pages 126-142

About these proceedings

Keywords

Apertur Implantation Ionenimplantation Planar Plantation Plasmat information laser metals paper polymer scattering semiconductor spectrometry surface analysis

Editors and affiliations

  • Heiner Ryssel
    • 1
  • Hans Glawischnig
    • 2
  1. 1.Fraunhofer-Institut für FestkörpertechnologieMünchen 60Germany
  2. 2.Siemens AGMünchen 80Germany

Bibliographic information

  • DOI https://doi.org/10.1007/978-3-642-69156-0
  • Copyright Information Springer-Verlag Berlin Heidelberg 1983
  • Publisher Name Springer, Berlin, Heidelberg
  • eBook Packages Springer Book Archive
  • Print ISBN 978-3-642-69158-4
  • Online ISBN 978-3-642-69156-0
  • Series Print ISSN 0172-5734
  • About this book