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Ion Implantation: Equipment and Techniques

Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982

  • Heiner Ryssel
  • Hans Glawischnig

Part of the Springer Series in Electrophysics book series (SSEP, volume 11)

Table of contents

  1. Front Matter
    Pages I-X
  2. Ion Implanters

    1. Front Matter
      Pages 1-1
    2. K. Tokiguchi, H. Itoh, N. Sakudo, H. Koike, T. Warabisako, T. Saitoh et al.
      Pages 25-30
    3. M. D. Nahemow, R. E. Fromson, R. Kossowsky, J. L. Pack
      Pages 31-36
    4. P. L. F. Hemment, J. E. Mynard, E. Pásztor, C. J. Richmond, K. G. Stephens
      Pages 37-44
    5. N. J. Barrett
      Pages 45-53
  3. Ion Sources

    1. Front Matter
      Pages 55-55
    2. E. Pásztor, L. Királyhidi
      Pages 59-62
    3. R. Keller, F. Nöhmayer, P. Spädtke
      Pages 79-85
    4. W. B. Thompson, I. Honjo, N. Turner
      Pages 86-96
    5. A. Latuszyński, D. Maczka, Yu. V. Yushkievich
      Pages 106-112
  4. Implanter Subsystems

    1. Front Matter
      Pages 113-113
    2. N. Turner
      Pages 126-142
    3. J. Wu, S. Yan, S. Yang, X. Deng
      Pages 149-154
    4. A. Armstrong, V. Benveniste, M. Farley, G. Ryding
      Pages 155-160
    5. H. Kranz, S. Steiner
      Pages 172-175
    6. U. K. Chaturvedi, V. Shrinet, S. K. Agrawal, A. K. Nigam
      Pages 176-184
  5. Special Implantation Techniques

    1. Front Matter
      Pages 185-185
    2. J. P. F. Sellschop, J. F. Prins, U. von Wimmersperg
      Pages 186-188
    3. J. N. McGruer, D. S. Croft, R. B. Irwin, J. A. Rabel, J. H. Sheehan, W. J. Choyke et al.
      Pages 189-195
    4. M. E. Mack
      Pages 221-232
    5. J. H. Chang, W. J. Choyke, N. J. Doyle
      Pages 233-239
  6. Ion Beam Lithography

    1. Front Matter
      Pages 241-241
    2. H. Ryssel, K. Haberger
      Pages 242-254
    3. L. Karapiperis, I. Adesida, C. A. Lee, E. D. Wolf
      Pages 255-262
    4. K. Haberger, K. Hoffmann, M. Forster, H. Ryssel
      Pages 263-268
    5. C. R. Fritzsche, K. M. Eisele
      Pages 269-272
  7. Measuring Techniques

    1. Front Matter
      Pages 273-273
    2. G. Ryding
      Pages 274-290
    3. P. L. F. Hemment, J. E. Mynard, E. A. Maydell-Ondrusz, K. G. Stephens
      Pages 291-299
    4. T. Giedrys, V. Grivickas, L. Pranevicius, J. Vaitkus
      Pages 308-312
    5. G. K. Wolf, F. Schreyer, G. Frech, F. Wagner
      Pages 313-317
    6. D. Fink, J. P. Biersack, H. Liebl
      Pages 318-326
  8. Implantation into Metals

    1. Front Matter
      Pages 331-331
    2. C. A. dos Santos, I. J. R. Baumvol
      Pages 347-356
    3. L. Calliari, L. Guzman, S. Lo Russo, C. Tosello, G. Wolf, G. Zobele
      Pages 357-363

About these proceedings

Keywords

Apertur Implantation Ionenimplantation Planar Plantation Plasmat information laser metals paper polymer scattering semiconductor spectrometry surface analysis

Editors and affiliations

  • Heiner Ryssel
    • 1
  • Hans Glawischnig
    • 2
  1. 1.Fraunhofer-Institut für FestkörpertechnologieMünchen 60Germany
  2. 2.Siemens AGMünchen 80Germany

Bibliographic information

  • DOI https://doi.org/10.1007/978-3-642-69156-0
  • Copyright Information Springer-Verlag Berlin Heidelberg 1983
  • Publisher Name Springer, Berlin, Heidelberg
  • eBook Packages Springer Book Archive
  • Print ISBN 978-3-642-69158-4
  • Online ISBN 978-3-642-69156-0
  • Series Print ISSN 0172-5734
  • Buy this book on publisher's site