Fundamental Aspects of Silicon Oxidation

  • Yves J. Chabal

Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 46)

Table of contents

  1. Front Matter
    Pages I-XIII
  2. Leonard C. Feldman
    Pages 1-11
  3. H. Nohira, T. Hattori
    Pages 61-88
  4. H. Watanabe, N. Miyata, M. Ichikawa
    Pages 89-105
  5. A. Pasquarello, M. S. Hybertsen, R. Car
    Pages 107-125
  6. Y. J. Chabal, M. K. Weldon, K. T. Queeney, A. Estève
    Pages 143-159
  7. W. H. Schulte, T. Gustafsson, E. Garfunkel, I. J. R. Baumvol, E. P. Gusev
    Pages 161-191
  8. S. T. Pantelides, R. Buczko, M. Ramamoorthy, S. Rashkeev, G. Duscher, S. J. Pennycook
    Pages 193-218
  9. Back Matter
    Pages 257-262

About this book

Introduction

This book presents fundamental experimental and theoretical developments relating to silicon oxidation for ultra-thin gate oxide formation. Starting with elementary processes taking place during wet chemical cleans prior to oxidation, the focus is then placed on the incorporation of oxygen into the silicon crystal for H-passivated, clean and oxidized silicon surfaces, including oxygen diffusion and defect formation. Experimental methods include scanning tunneling microscopy, x-ray photoelectron and infrared absorption spectroscopies, ion scattering and transmission electron microscopy. Most of the theoretical contributions are based on first-principles calculations, ranging from cluster calculations to supercell and slab calculations. Phenomenological modeling of oxidation is also discussed. The material presented here will enable the reader to gain a deeper understanding of silicon oxidation and ultra-thin oxide formation (and the processes that affect the morphology of silicon oxides).

Keywords

EELS STEM chemistry dynamics electron energy loss spectroscopy electron microscopy electron spectroscopy electronic structure microscopy oxidation silicon spectroscopy surface surfaces tunneling

Editors and affiliations

  • Yves J. Chabal
    • 1
  1. 1.Agere SystemsElectronic and Photonic Materials Physics ResearchMurray HillUSA

Bibliographic information

  • DOI https://doi.org/10.1007/978-3-642-56711-7
  • Copyright Information Springer-Verlag Berlin Heidelberg 2001
  • Publisher Name Springer, Berlin, Heidelberg
  • eBook Packages Springer Book Archive
  • Print ISBN 978-3-642-62583-1
  • Online ISBN 978-3-642-56711-7
  • Series Print ISSN 0933-033X
  • Series Online ISSN 2196-2812
  • About this book