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Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

  • Seongbo Shim
  • Youngsoo Shin

Part of the NanoScience and Technology book series (NANO)

Table of contents

  1. Front Matter
    Pages i-xiv
  2. Seongbo Shim, Youngsoo Shin
    Pages 1-12
  3. Physical Design Optimizations

    1. Front Matter
      Pages 13-13
    2. Seongbo Shim, Youngsoo Shin
      Pages 15-24
    3. Seongbo Shim, Youngsoo Shin
      Pages 25-39
    4. Seongbo Shim, Youngsoo Shin
      Pages 41-50
    5. Seongbo Shim, Youngsoo Shin
      Pages 51-61
    6. Seongbo Shim, Youngsoo Shin
      Pages 63-73
  4. Mask Synthesis and Optimizations

    1. Front Matter
      Pages 75-75
    2. Seongbo Shim, Youngsoo Shin
      Pages 77-92
    3. Seongbo Shim, Youngsoo Shin
      Pages 93-115
    4. Seongbo Shim, Youngsoo Shin
      Pages 117-130
    5. Seongbo Shim, Youngsoo Shin
      Pages 131-133
  5. Back Matter
    Pages 135-138

About this book

Introduction

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

Keywords

VLSI CAD for DSA Physical Design for DSA DSA-Friendly VLSI Design DSA.Aware Placement DSA-Aware Routing DSA-Aware Mask Optimization DSA-Aware OPC DSA Verification Multi-Patterning with DSA Inverse DSA Nanolithography Computational Litography

Authors and affiliations

  • Seongbo Shim
    • 1
  • Youngsoo Shin
    • 2
  1. 1.Samsung ElectronicsHwasungKorea (Republic of)
  2. 2.KAISTDaejeonKorea (Republic of)

Bibliographic information

  • DOI https://doi.org/10.1007/978-3-319-76294-4
  • Copyright Information Springer International Publishing AG, part of Springer Nature 2018
  • Publisher Name Springer, Cham
  • eBook Packages Chemistry and Materials Science
  • Print ISBN 978-3-319-76293-7
  • Online ISBN 978-3-319-76294-4
  • Series Print ISSN 1434-4904
  • Series Online ISSN 2197-7127
  • Buy this book on publisher's site