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Scanning Electron Microscopy and X-Ray Microanalysis

  • Joseph I. Goldstein
  • Dale E. Newbury
  • Joseph R. Michael
  • Nicholas W.M. Ritchie
  • John Henry J. Scott
  • David C. Joy
Textbook

Table of contents

  1. Front Matter
    Pages I-XXIII
  2. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 1-14
  3. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 15-28
  4. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 29-37
  5. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 39-63
  6. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 65-91
  7. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 93-110
  8. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 111-121
  9. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 123-131
  10. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 133-146
  11. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 147-164
  12. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 165-172
  13. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 173-185
  14. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 187-193
  15. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 195-200
  16. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 201-207
  17. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 209-234
  18. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 235-264
  19. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 265-287
  20. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 289-307
  21. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 309-339
  22. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 341-357
  23. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 359-380
  24. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 381-411
  25. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 413-439
  26. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 441-459
  27. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 461-470
  28. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 471-479
  29. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 481-489
  30. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 491-515
  31. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 517-528
  32. Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy
    Pages 529-539
  33. Back Matter
    Pages 541-550

About this book

Introduction

This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners — engineers, technicians, physical and biological scientists, clinicians, and technical managers — will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope’s software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective andmeaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD).

With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal.
  • Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers
  • Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results
  • Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements
  • Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.
  • Includes case studies to illustrate practical problem solving
  • Covers Helium ion scanning microscopy
  • Organized into relatively self-contained modules – no need to "read it all" to understand a topic
  • Includes an online supplement—an extensive "Database of Electronic–Solid Interactions"—which can be accessed on SpringerLink, in Chapter 3

Keywords

EBSD Electron backscatter diffraction Environmental SEM Focused ion beam Ion beam microanalysis Qualitative X-ray analysis Quantitative X-ray analysis SDD x-ray detectors SEM textbook Table top SEM Variable pressure SEM X-ray mapping X-ray microanalysis book X-ray spectral measurement dual column instruments

Authors and affiliations

  • Joseph I. Goldstein
    • 1
  • Dale E. Newbury
    • 2
  • Joseph R. Michael
    • 3
  • Nicholas W.M. Ritchie
    • 4
  • John Henry J. Scott
    • 5
  • David C. Joy
    • 6
  1. 1.University of Massachusetts AmherstUSA
  2. 2.National Institute of Standards and Technology GaithersburgUSA
  3. 3.Sandia National Laboratories AlbuquerqueUSA
  4. 4.National Institute of Standards and TechnologyGaithersburgUSA
  5. 5.National Institute of Standards and Technology GaithersburgUSA
  6. 6.University of Tennessee RoomKnoxvilleUSA

Bibliographic information