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Chemical Vapor Deposition

Thermal and Plasma Deposition of Electronic Materials

  • Authors
  • Srinivasan┬áSivaram

Table of contents

  1. Front Matter
    Pages i-xii
  2. Srinivasan Sivaram
    Pages 1-7
  3. Srinivasan Sivaram
    Pages 8-40
  4. Srinivasan Sivaram
    Pages 41-61
  5. Srinivasan Sivaram
    Pages 62-93
  6. Srinivasan Sivaram
    Pages 94-118
  7. Srinivasan Sivaram
    Pages 119-143
  8. Srinivasan Sivaram
    Pages 144-162
  9. Srinivasan Sivaram
    Pages 163-203
  10. Srinivasan Sivaram
    Pages 204-226
  11. Srinivasan Sivaram
    Pages 227-265
  12. Srinivasan Sivaram
    Pages 266-272
  13. Back Matter
    Pages 273-292

About this book

Introduction

In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.

Keywords

chemistry deposition design dielectrics engine film kinetics processing research semiconductor semiconductors thin films vapor

Bibliographic information