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Lecture Notes on Principles of Plasma Processing

  • Francis F. Chen
  • Jane P. Chang

Table of contents

  1. Front Matter
    Pages i-ix
  2. Francis F. Chen, Jane P. Chang
    Pages 1-3
  3. Francis F. Chen, Jane P. Chang
    Pages 3-10
  4. Francis F. Chen, Jane P. Chang
    Pages 11-24
  5. Francis F. Chen, Jane P. Chang
    Pages 25-30
  6. Francis F. Chen, Jane P. Chang
    Pages 31-46
  7. Francis F. Chen, Jane P. Chang
    Pages 47-49
  8. Francis F. Chen, Jane P. Chang
    Pages 49-60
  9. Francis F. Chen, Jane P. Chang
    Pages 61-69
  10. Francis F. Chen, Jane P. Chang
    Pages 69-74
  11. Francis F. Chen, Jane P. Chang
    Pages 75-75
  12. Francis F. Chen, Jane P. Chang
    Pages 75-79
  13. Francis F. Chen, Jane P. Chang
    Pages 79-93
  14. Francis F. Chen, Jane P. Chang
    Pages 93-97
  15. Francis F. Chen, Jane P. Chang
    Pages 99-100
  16. Francis F. Chen, Jane P. Chang
    Pages 100-102
  17. Francis F. Chen, Jane P. Chang
    Pages 103-109
  18. Francis F. Chen, Jane P. Chang
    Pages 109-119
  19. Francis F. Chen, Jane P. Chang
    Pages 119-123
  20. Francis F. Chen, Jane P. Chang
    Pages 125-126
  21. Francis F. Chen, Jane P. Chang
    Pages 126-129
  22. Francis F. Chen, Jane P. Chang
    Pages 129-130
  23. Francis F. Chen, Jane P. Chang
    Pages 130-136
  24. Francis F. Chen, Jane P. Chang
    Pages 137-139
  25. Francis F. Chen, Jane P. Chang
    Pages 139-139
  26. Francis F. Chen, Jane P. Chang
    Pages 140-142
  27. Francis F. Chen, Jane P. Chang
    Pages 142-143
  28. Francis F. Chen, Jane P. Chang
    Pages 143-149
  29. Francis F. Chen, Jane P. Chang
    Pages 151-160
  30. Francis F. Chen, Jane P. Chang
    Pages 161-162
  31. Francis F. Chen, Jane P. Chang
    Pages 162-163
  32. Francis F. Chen, Jane P. Chang
    Pages 163-164
  33. Francis F. Chen, Jane P. Chang
    Pages 164-166
  34. Francis F. Chen, Jane P. Chang
    Pages 167-167
  35. Francis F. Chen, Jane P. Chang
    Pages 167-177
  36. Francis F. Chen, Jane P. Chang
    Pages 177-178
  37. Francis F. Chen, Jane P. Chang
    Pages 178-179
  38. Francis F. Chen, Jane P. Chang
    Pages 179-181
  39. Francis F. Chen, Jane P. Chang
    Pages 183-185
  40. Francis F. Chen, Jane P. Chang
    Pages 185-186
  41. Francis F. Chen, Jane P. Chang
    Pages 186-190
  42. Francis F. Chen, Jane P. Chang
    Pages 190-193
  43. Francis F. Chen, Jane P. Chang
    Pages 193-197
  44. Back Matter
    Pages 199-208

About this book

Introduction

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes.

This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Keywords

Plasma Vakuuminjektionsverfahren chemical engineering chemistry color dielectrics plasma physics semiconductor simulation

Authors and affiliations

  • Francis F. Chen
    • 1
  • Jane P. Chang
    • 2
  1. 1.Electrical Engineering DepartmentUniversity of CaliforniaLos AngelesUSA
  2. 2.Chemical Engineering DepartmentUniversity of CaliforniaLos AngelesUSA

Bibliographic information

  • DOI https://doi.org/10.1007/978-1-4615-0181-7
  • Copyright Information Kluwer Academic/Plenum Publishers, New York 2003
  • Publisher Name Springer, Boston, MA
  • eBook Packages Springer Book Archive
  • Print ISBN 978-0-306-47497-2
  • Online ISBN 978-1-4615-0181-7
  • Buy this book on publisher's site