Copper Interconnect Technology

  • TapanĀ Gupta

Table of contents

  1. Front Matter
    Pages i-xix
  2. Tapan Gupta
    Pages 1-65
  3. Tapan Gupta
    Pages 67-110
  4. Tapan Gupta
    Pages 111-159
  5. Tapan Gupta
    Pages 161-222
  6. Tapan Gupta
    Pages 301-345
  7. Tapan Gupta
    Pages 347-403
  8. Back Matter
    Pages 405-423

About this book


Since overall circuit performance has depended primarily on transistor properties, previous efforts to enhance circuit and system speed were focused on transistors as well. During the last decade, however, the parasitic resistance, capacitance, and inductance associated with interconnections began to influence circuit performance and will be the primary factors in the evolution of nanoscale ULSI technology. Because metallic conductivity and resistance to electromigration of bulk copper (Cu) are better than aluminum, use of copper and low-k materials now prevails in the international microelectronics industry. However, as the feature size of the Cu-lines forming interconnects is scaled, resistivity of the lines increases. At the same time electromigration and stress-induced voids due to increased current density become significant reliability issues. Although copper/low-k technology has become fairly mature, there is no single book available on the promise and challenges of these next-generation technologies. In this book, a leader in the field describes advanced laser systems with lower radiation wavelengths, photolithography materials, and mathematical modeling approaches to address the challenges of Cu-interconnect technology.


circuit performance copper/low-k technology cu interconnect technology electronics electronics packaging electronics packaging reliability laser material nanoscale usli technology nanostructured copper interconnects parasitic resistance, capacit

Authors and affiliations

  • TapanĀ Gupta
    • 1
  1. 1.WinchesterUSA

Bibliographic information

  • DOI
  • Copyright Information Springer-Verlag New York 2009
  • Publisher Name Springer, New York, NY
  • eBook Packages Engineering
  • Print ISBN 978-1-4419-0075-3
  • Online ISBN 978-1-4419-0076-0
  • Buy this book on publisher's site