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NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies

  • M. Gentili
  • C. Giovannella
  • S. Selci

Part of the NATO ASI Series book series (NSSE, volume 264)

Table of contents

  1. Front Matter
    Pages i-xii
  2. Electron Beam Lithography

    1. Fritz J. Hohn
      Pages 1-11
    2. Shinji Matsui, Yukinori Ochiai, Masakazu Baba, Heiji Watanabe
      Pages 25-43
    3. Xiaodan Pan, A. N. Broers
      Pages 45-51
    4. Wolfram Langheinrich, Heinz Beneking
      Pages 53-66
    5. M. Böttcher, L. Bauch, A. Wolff, W. Höppner
      Pages 67-72
    6. P. Ils, M. Michel, A. Forchel, I. Gyuro, P. Speier, E. Zielinski
      Pages 77-80
    7. A. Menschig, F. E. Prins, G. Lehr, R. Bergmann, J. Hommel, U. A. Griesinger et al.
      Pages 81-85
    8. H. W. P. Koops, M. Rudolph, J. Kretz, M. Weber
      Pages 87-93
    9. B. A. Wallman, P. G. Crawley
      Pages 95-101
  3. X-Ray Lithography

    1. Henry I. Smith, M. L. Schattenburg
      Pages 103-119
    2. F. Cerrina, J. Xiao, Z. Y. Guo
      Pages 121-127
  4. Ion Beam Lithography

    1. S. Kalbitzer, Ch. Wilbertz, Th. Miller
      Pages 137-147
    2. W. Fallmann, A. Bruckner, E. Cekan, W. Friza, F. Paschke, G. Stangl et al.
      Pages 149-158
  5. STM Lithography

    1. A. L. de Lozanne, W. F. Smith, E. E. Ehrichs
      Pages 159-174
    2. C. R. K. Marrian, F. K. Perkins, S. L. Brandow, T. S. Koloski, E. A. Dobisz, J. M. Calvert
      Pages 175-188
    3. L. Stockman, C. van Haesendonck, G. Neuttiens, Y. Bruynseraede
      Pages 197-205
    4. I. Heyvaert, E. Osquiguil, C. Van Haesendonck, Y. Bruynseraede
      Pages 207-212
  6. Back Matter
    Pages 213-215

About this book

Introduction

Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography.
Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).

Keywords

AES PAS PED REM STEM STM

Editors and affiliations

  • M. Gentili
    • 1
  • C. Giovannella
    • 2
  • S. Selci
    • 3
  1. 1.CNR-Instituto di Elettronica dello Stato SolidoRomaItaly
  2. 2.Dipartimento di FisicaUniversità di Roma “Tor Vergata”RomaItaly
  3. 3.CNR-Instituto di Struttura della MateriaFrascati, RomaItaly

Bibliographic information

  • DOI https://doi.org/10.1007/978-94-015-8261-2
  • Copyright Information Springer Science+Business Media B.V. 1994
  • Publisher Name Springer, Dordrecht
  • eBook Packages Springer Book Archive
  • Print ISBN 978-90-481-4388-7
  • Online ISBN 978-94-015-8261-2
  • Series Print ISSN 0168-132X
  • Buy this book on publisher's site