© 1992

Crucial Issues in Semiconductor Materials and Processing Technologies

  • S. Coffa
  • F. Priolo
  • E. Rimini
  • J. M. Poate

Part of the NATO ASI Series book series (NSSE, volume 222)

Table of contents

  1. Front Matter
    Pages i-xix
  2. Materials & Devices

  3. Processing Technologies

    1. Front Matter
      Pages 109-109
    2. L. C. Kimerling
      Pages 111-117
    3. M. Geddo, B. Pivac
      Pages 119-127
    4. A. Castaldini, D. Cavalcoli, A. Cavallini
      Pages 135-139
    5. H. Bemelmans, G. Borghs, G. Langouche
      Pages 141-145
    6. Henry I. Smith, M. L. Schattenburg
      Pages 153-166
    7. E. Rimini
      Pages 167-194

About this book


Semiconductors lie at the heart of some of the most important industries and technologies of the twentieth century. The complexity of silicon integrated circuits is increasing considerably because of the continuous dimensional shrinkage to improve efficiency and functionality. This evolution in design rules poses real challenges for the materials scientists and processing engineers. Materials, defects and processing now have to be understood in their totality. World experts discuss, in this volume, the crucial issues facing lithography, ion implication and plasma processing, metallization and insulating layer quality, and crystal growth. Particular emphasis is placed upon silicon, but compound semiconductors and photonic materials are also highlighted. The fundamental concepts of phase stability, interfaces and defects play a key role in understanding these crucial issues. These concepts are reviewed in a crucial fashion.


Transistor complexity field-effect transistor integrated circuit metal oxide semiconductur field-effect transistor metal-oxide-semiconductor transistor static-induction transistor thin film thin film transistor

Editors and affiliations

  • S. Coffa
    • 1
  • F. Priolo
    • 1
  • E. Rimini
    • 1
  • J. M. Poate
    • 2
  1. 1.Physics DepartmentUniversity of CataniaCataniaItaly
  2. 2.AT&T Bell LaboratoriesMurray HillUSA

Bibliographic information