Low Dimensional Structures Prepared by Epitaxial Growth or Regrowth on Patterned Substrates

  • Karl Eberl
  • Pierre M. Petroff
  • Piet Demeester

Part of the NATO ASI Series book series (NSSE, volume 298)

Table of contents

  1. Front Matter
    Pages i-xi
  2. Theoretical Aspects of Epitaxial Growth

    1. Dimitri D. Vvedensky, Pavel Šmilauer, Christian Ratsch, Andrew Zangwill
      Pages 1-12
  3. Self Assembling Nanostructures / Cluster Formation

    1. A. Madhukar, P. Chen, Q. Xie, A. Konkar, T. R. Ramachandran, N. P. Kobayashi et al.
      Pages 19-33
    2. J. M. Gerard, J. B. Genin, J. Lefebvre, J. Y. Marzin, D. Barrier, J. M. Moison
      Pages 35-48
    3. A. Kurtenbach, K. Eberl, K. Brunner, G. Abstreiter
      Pages 59-67
    4. H. A. Atwater, K. J. Vahala, R. C. Flagan, R. Camata, R. B. Lee, K. V. Shcheglov et al.
      Pages 69-80
  4. Growth on Tilted and Non-(001) Surfaces

    1. Richard Nötzel, Jiro Temmyo, Hidehiko Kamada, Tomofumi Furuta, Toshiaki Tamamura, Takashi Fukui et al.
      Pages 81-92
    2. L. Pfeiffer, H. Baranger, D. Gershoni, K. Smith, W. Wegscheider
      Pages 93-100
    3. L. Däweritz, M. Ramsteiner, K. Stahrenberg, R. Hey, P. Schützendübe, K. Ploog
      Pages 125-138
  5. Nanostructure Growth on Patterned Silicon Substrates

    1. Y. Shiraki, N. Usami, T. Mine, N. Akiyama, S. Fukatsu
      Pages 151-160
    2. I. Eisele, H. Baumgärtner, W. Hansch
      Pages 161-172
    3. R. J. Phaneuf, Hung-Chih Kan, E. D. Williams
      Pages 185-195
  6. Nanostructures Prepared by Selective Epitaxy or Regrowth on Patterned Substrates

    1. T. F. Kuech, S. Nayak
      Pages 207-217
    2. J. C. Roberts, K. S. Boutros, S. M. Bedair
      Pages 219-227
    3. P. Demeester, G. Vermeire, F. Vermaerke, I. Moerman, P. Van Daele, A. Gustafsson et al.
      Pages 253-264
    4. Takashi Fukui, Kazuhide Kumakura, Kazuaki Nakakoshi, Junichi Motohisa
      Pages 265-270
    5. H. Noge, Y. Nakamura, S. Koshiba, Y. Kadoya, T. Someya, Y. Ohno et al.
      Pages 271-282
    6. Werner Wegscheider, Loren Pfeiffer, Kenneth West
      Pages 283-290
    7. E. Kapon, G. Biasiol, D. M. Hwang, E. Colas
      Pages 291-300
    8. G. S. Solomon, C. I. Duruöz, J. A. Trezza, R. M. Clarke, C. M. Marcus, J. S. Harris Jr.
      Pages 313-324
  7. In-Situ Processing and Device Applications Based on Epitaxial Regrowth

    1. Y. Horikoshi, S. Ando, H. Ando, N. Kobayashi
      Pages 325-333
    2. TH. Hackbarth, H. Muessig, G. Jonsson, H. Brugger
      Pages 345-355
    3. T. A. Strand, B. J. Thibeault, D. S. L. Mui, R. L. Naone, L. A. Coldren, P. M. Petroff et al.
      Pages 377-386

About this book


chemistry defects electron epitaxy morphology nanostructure quantum dot quantum wells quantum wire semiconductor semiconductors simulation spectroscopy

Editors and affiliations

  • Karl Eberl
    • 1
  • Pierre M. Petroff
    • 2
  • Piet Demeester
    • 3
  1. 1.Max-Planck-Institut für FestkörperforschungStuttgartGermany
  2. 2.Materials Department, College of EngineeringUniversity of CaliforniaSanta BarbaraUSA
  3. 3.Department of Information TechnologyUniversity Gent — IMECGentBelgium

Bibliographic information

  • DOI
  • Copyright Information Kluwer Academic Publishers 1995
  • Publisher Name Springer, Dordrecht
  • eBook Packages Springer Book Archive
  • Print ISBN 978-94-010-4151-5
  • Online ISBN 978-94-011-0341-1
  • Series Print ISSN 0168-132X
  • Buy this book on publisher's site