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Photovoltaic Power Generation

Proceedings of the Second Contractors’ Meeting held in Hamburg, 16–18 September 1987

  • R. van Overstraeten
  • G. Caratti
Conference proceedings

Part of the Solar Energy Development — Third Programme book series (SEDE, volume 3)

Table of contents

  1. Front Matter
    Pages i-x
  2. Amorphous Silicon Solar Cells (AMOR)

    1. J. P. M. Schmitt, S. A. Solems, G. Winterling, G. Willeke, P. Nagels, H. H. Brongersma et al.
      Pages 1-136
    2. A. Christou, Marco V. Ginatta, T. A. Shamsi
      Pages 137-156
  3. Thin Film Solar Cells from Alternative Materials (Alterna)

    1. M. Caymax, G. Revel, A. Luque, G. Sala, D. Margadonna, Sergio Pizzini
      Pages 157-198
    2. H. W. Schock, M. Saveli, J. Bougnot, S. Duchemin, V. Chen, J. C. Yoyotte et al.
      Pages 199-233
    3. L. J. Giling, G. Borghs, L. Zanotti, C. Verie, M. Garozzo, C. Flores et al.
      Pages 234-301
  4. Back Matter
    Pages 303-311

About these proceedings

Introduction

Amorphous silicon PV panel mass production will require to mas­ ter plasma chemical deposition in terms of large sizes, cost, maintenance and all other problems related to industrialization. Since plasma deposition is a novel technique, the development of all this production related know how involves a considerable technical research effort. The major problems related to the design of a production deposi­ tion machine are the following - deposition should be uniform on very large area substrate (typical dimension 1 meter) ; - the deposited amorphous silicon should have good electronic properties (density of state of the order or less than 16 3 10 cm /eV) and very low impurities concentrations (for exam­ ple oxygen atomic concentration should idealy be less than 0. 01 %) ; - the film stress should be limited, the density of ponctual defects (particulates) should remain reasonable (less than 2 per 100 cm ) ; - dopant level control should be stable and efficient ; - silane consumption should remain reasonably efficient - financial cost being important the machine productivity should be high hence deposition rate optimized ; - downtime due to maintenance should be reduced to a minimum. We present here some results on the R&D effort addressed to the above mentioned problems. An original single chamber was designed. This machine will be made available on the market for R&D purposes by a process machine company. Finally the maintenance problem is considered. Plasma cleaning based on a fluorine containing etchant gases is studied and evaluated. 2.

Keywords

Substrat hydrogen material solar cell

Editors and affiliations

  • R. van Overstraeten
    • 1
  • G. Caratti
    • 1
  1. 1.Commission of the European CommunitiesBrusselsBelgium

Bibliographic information

  • DOI https://doi.org/10.1007/978-94-009-2933-3
  • Copyright Information Springer Science+Business Media B.V. 1988
  • Publisher Name Springer, Dordrecht
  • eBook Packages Springer Book Archive
  • Print ISBN 978-94-010-7821-4
  • Online ISBN 978-94-009-2933-3
  • Buy this book on publisher's site