Technology CAD Systems

  • Franz Fasching
  • Stefan Halama
  • Siegfried Selberherr

Table of contents

  1. Front Matter
    Pages i-viii
  2. P. Lloyd, C. C. McAndrew, M. J. McLennan, S. Nassif, K. Singhal, Ku. Singhal et al.
    Pages 1-24
  3. R. W. Knepper, J. B. Johnson, S. Furkay, J. Slinkman, X. Tian, E. M. Buturla et al.
    Pages 25-62
  4. J. Mar
    Pages 63-74
  5. A. Neureuther, R. Wang, J. Helmsen
    Pages 75-81
  6. D. M. H. Walker, J. K. Kibarian, Ch. S. Kellen, A. J. Strojwas
    Pages 83-111
  7. W. Jacobs
    Pages 147-162
  8. J. Lorenz, C. Hill, H. Jaouen, C. Lombardi, C. Lyden, K. De Meyer et al.
    Pages 163-196
  9. S. Halama, F. Fasching, C. Fischer, H. Kosina, E. Leitner, Ch. Pichler et al.
    Pages 197-236
  10. N. Tanabe
    Pages 237-253
  11. K. Nishi, J. Ueda
    Pages 255-273
  12. P. J. Hopper, P. A. Blakey
    Pages 275-292
  13. V. Axelrad, Y. Granik, R. Jewell
    Pages 293-307
  14. Back Matter
    Pages 309-312

About these proceedings


As the cost of developing new semiconductor technology at ever higher bit/gate densities continues to grow, the value of using accurate TCAD simu­ lation tools for design and development becomes more and more of a necessity to compete in today's business. The ability to tradeoff wafer starts in an advanced piloting facility for simulation analysis and optimization utilizing a "virtual fab" S/W tool set is a clear economical asset for any semiconductor development company. Consequently, development of more sophisticated, accurate, physics-based, and easy-to-use device and process modeling tools will receive continuing attention over the coming years. The cost of maintaining and paying for one's own internal modeling tool development effort, however, has caused many semiconductor development companies to consider replacing some or all of their internal tool development effort with the purchase of vendor modeling tools. While some (noteably larger) companies have insisted on maintaining their own internal modeling tool development organization, others have elected to depend totally on the tools offered by the TCAD vendors and have consequently reduced their mod­ eling staffs to a bare minimal support function. Others are seeking to combine the best of their internally developed tool suite with "robust", "proven" tools provided by the vendors, hoping to achieve a certain synergy as well as savings through this approach. In the following sections we describe IBM's internally developed suite of TCAD modeling tools and show several applications of the use of these tools.


CAD System architecture computer-aided design (CAD) semiconductor devices simulation

Editors and affiliations

  • Franz Fasching
    • 1
  • Stefan Halama
    • 1
  • Siegfried Selberherr
    • 1
  1. 1.Institut für MikroelektronikTechnische Universität WienAustria

Bibliographic information