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Secondary Ion Mass Spectrometry SIMS V

Proceedings of the Fifth International Conference, Washington, DC, September 30 – October 4, 1985

  • Alfred Benninghoven
  • Richard J. Colton
  • David S. Simons
  • Helmut W. Werner
Conference proceedings

Part of the Springer Series in Chemical Physics book series (CHEMICAL, volume 44)

Table of contents

  1. Front Matter
    Pages I-XXI
    PDF

  2. Retrospective

    1. Front Matter
      Pages 1-1
      PDF
    2. The Growth of Secondary Ion Mass Spectrometry (SIMS): A Personal View of Its Development
      R. E. Honig
      Pages 2-15

  3. Fundamentals

    1. Front Matter
      Pages 17-17
      PDF
    2. Density-Functional Studies of the Atom-Surface Interaction and the Ionization Probability of Sputtered Atoms
      N. D. Lang
      Pages 18-25
    3. Origin of the Chemical Enhancement of Positive Secondary Ion Yield in SIMS
      K. Mann, M. L. Yu
      Pages 26-28
    4. Ion Pair Production as Main Process of SIMS for Inorganic Solids
      C. Plog, G. Roth, W. Gerhard, W. Kerfin
      Pages 29-31
    5. Sputtering and Secondary Ion Emission From Metals and Alloys Subjected to Oxygen Ion Bombardment
      Y. Taga
      Pages 32-37
    6. Measurements of the SIMS Isotope Effect
      S. A. Schwarz
      Pages 38-40
    7. SIMS Study of Self-Diffusion in Liquid Tin and of Associated Isotope Effects
      U. Södervall, H. Odelius, A. Lodding, G. Frohberg, K. H. Kraatz, H. Wever
      Pages 41-44
    8. Silicon-Induced Enhancement of Secondary Ion Emission in Silicates: A Study of the Matrix Effects
      N. Shimizu
      Pages 45-47
    9. Ionization Probabilities of Polycrystalline Metal Surfaces
      M. M. Brudny, K. D. Klöppel
      Pages 48-50
    10. Reactivity and Structure of Sputtered Species
      R. B. Freas, J. E. Campana
      Pages 51-53
    11. Local Thermal Equilibrium Model of Molecular Secondary Ion Emission
      P. J. Todd
      Pages 54-56
    12. Time-of-Flight Investigations of Secondary Ion Emission from Metal Halides
      B. Schueler, R. Beavis, G. Bolbach, W. Ens, D. E. Main, K. G. Standing
      Pages 57-59
    13. Multicharged Secondary Ions from Light Metals (Mg, Al, Si)
      J.-F. Hennequin, R.-L. Inglebert, P. Viaris de Lesegno
      Pages 60-62
    14. Population of Ion Clusters Sputtered from Metallic Elements with 10 keV Ar+
      F. G. Satkiewicz
      Pages 63-65
    15. Ejection and Ionization Efficiencies in Electron and Ion-Stimulated Desorption from Covalently Bound Surface Structures
      T. R. Hayes, J. F. Evans
      Pages 66-68

  4. Symposium: Detection of Sputtered Neutrals

    1. Front Matter
      Pages 69-69
      PDF
    2. Electron Gas SNMS
      H. Oechsner
      Pages 70-74
    3. Glow Discharge Mass Spectrometry
      W. W. Harrison, K. R. Hess, R. K. Marcus, F. L. King
      Pages 75-78
    4. Electron Beam Postionization of Sputtered Neutrals
      O. Ganschow
      Pages 79-84
    5. General Postionization of Sputtered and Desorbed Species by Intense Untuned Radiation
      C. H. Becker, K. T. Gillen
      Pages 85-89
    6. Multi-Photon Resonance Ionization of Emitted Particles
      G. A. Schick, J. P. Baxter, J. Subbiah-Singh, P. H. Kobrin, N. Winograd
      Pages 90-93
    7. Post-Ionization of Sputtered Particles: A Brief Review
      W. Reuter
      Pages 94-102
    8. Quantitatve Analysis Using Sputtered Neutrals in an Ion Microanalyser
      P. Williams
      Pages 103-104
    9. Quantitative Analysis of Iron and Steel by Mass Spectrometry
      J. Dittmann, F. Leiber, J. Tümpner, A. Benninghoven
      Pages 105-107
    10. Ion Microprobe Mass Spectrometry Using Sputtering Atomization and Resonance Ionization
      D. L. Donohue, W. H. Christie, D. E. Goeringer
      Pages 108-110

  5. Detection Limits and Quantification

    1. Front Matter
      Pages 111-111
      PDF
    2. Memory Effects in Quadrupole SIMS
      J. B. Clegg
      Pages 112-114
    3. Correction for Residual Gas Background in SIMS Analysis
      G. J. Scilla
      Pages 115-117
    4. Cross — Calibration of SIMS Instruments for Analysis of Metals and Semiconductors
      F. G. Rüdenauer, W. Steiger, M. Riedel, H. E. Beske, H. Holzbrecher, H. Düsterhöft et al.
      Pages 118-120
    5. On-Line Ion Implantation: The SIMS Primary Ion Beam for Creation of Empirical Quantification Standards
      H. E. Smith, M. T. Bernius, G. H. Morrison
      Pages 121-123
    6. Matrix Effects in the Quantitative Elemental Analysis of Plastic-Embedded and Ashed Biological Tissue by SIMS
      J. T. Brenna, G. H. Morrison
      Pages 124-126
    7. Reproducible Quantitative SIMS Analysis of Semiconductors in the Cameca IMS 3F
      G. D. T. Spiller, T. Ambridge
      Pages 127-129

  6. Instrumentation

    1. Front Matter
      Pages 131-131
      PDF
    2. Imaging SIMS at 20 nm Lateral Resolution: Exploratory Research Applications
      R. Levi-Setti, G. Crow, Y. L. Wang
      Pages 132-138
    3. Use of a Compact Cs Gun Together with a Liquid Metal Ion Source for High Sensitivity Submicron SIMS
      Tsuyoshi Okutani, T. Shinomiya, M. Ohshima, T. Noda, H. Tamura, H. Watanabe
      Pages 139-141
    4. Secondary Ion Mass Spectrometer with Liquid Metal Field Ion Source and Quadrupole Mass Analyzer
      J. M. Schroeer, J. Puretz
      Pages 142-145
    5. Evaluation of a New Cesium Ion Source for SIMS
      D. G. Welkie
      Pages 146-148
    6. Survey of Alkali Primary Ion Sources for SIMS
      R. T. Lareau, P. Williams
      Pages 149-151
    7. Non-Oxygen Negative Primary Ion Beams for Oxygen Isotopic Analysis in Insulators
      R. L. Hervig, P. Williams
      Pages 152-154
    8. A New SIMS Instrument: The Cameca IMS 4F
      H. N. Migeon, C. Le Pipec, J. J. Le Goux
      Pages 155-157
    9. The Emission Objective Lens Working as an Electron Mirror: Self Regulated Potential at the Surface of an Insulating Sample
      G. Slodzian, M. Chaintreau, R. Dennebouy
      Pages 158-160
    10. 20 K-Cryopanel-Equipped SIMS Instrument for Analysis Under Ultrahigh Vacuum
      Y. Homma, Y. Ishii
      Pages 161-163
    11. Improvement of an Ion Microprobe Mass Analyzer (IMMA)
      K. Miethe, A. Pöcker
      Pages 164-166
    12. A High-Performance Analyzing System for SIMS
      Liangzhen Cha, Zuqing Xue, Ziqiang Rao, Weihua Liu, Yuqing Tong
      Pages 167-169
    13. Characterization of Electron Multipliers by Charge Distributions
      E. Zinner, A. J. Fahey, K. D. McKeegan
      Pages 170-172
    14. Automated Collection of SIMS Data with Energy Dispersive X-Ray Analysis Hardware
      D. M. Anderson, E. L. Williams
      Pages 173-175
    15. Software and Interfaces for the Automatic Operation of a Quadrupole SIMS Instrument
      M. G. Dowsett, J. W. Heal, H. Fox, E. H. C. Parker
      Pages 176-178

About these proceedings

Keywords

Atom Diffusion Sorption adsorption catalyst chemistry crystal hydrogen isotope mass spectrometry materials science metals microscopy spectrometry structure

Editors and affiliations

  • Alfred Benninghoven
    • 1
  • Richard J. Colton
    • 2
  • David S. Simons
    • 3
  • Helmut W. Werner
    • 4
  1. 1.Physikalisches InstitutUniversität MünsterMünsterFed. Rep. of Germany
  2. 2.Chemistry DivisionNaval Research LaboratoryUSA
  3. 3.Center for Analytical ChemistryNational Bureau of StandardsGaithersburgUSA
  4. 4.Philips Research LaboratoriesNL-EindhovenThe Netherlands

Bibliographic information

  • DOI https://doi.org/10.1007/978-3-642-82724-2
  • Copyright Information Springer-Verlag Berlin Heidelberg 1986
  • Publisher Name Springer, Berlin, Heidelberg
  • eBook Packages Springer Book Archive
  • Print ISBN 978-3-642-82726-6
  • Online ISBN 978-3-642-82724-2
  • Series Print ISSN 0172-6218
  • Buy this book on publisher's site