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Ion Beams in Nanoscience and Technology

  • Book
  • © 2010

Overview

Editors:
  1. Ragnar Hellborg

    1. Inst. Technology, University of Lund, Lund, Sweden

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  2. Harry J. Whitlow

    1. Dept. Physics, University of Jyväskylä, Jyväskylä, Finland

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    You can also search for this editor in PubMed   Google Scholar

  3. Yanwen Zhang

    1. Pacific Northwest National Laboratory, Richland, U.S.A.

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Part of the book series: Particle Acceleration and Detection (PARTICLE)

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Table of contents (34 chapters)

  1. Ion beam characterisation of nanoscale materials

    1. Nanomaterials Science with Radioactive Ion Beams

      • Jyrki Räisänen
      Pages 219-235

  2. Nanoscale Materials Processing with Ion Beams

    1. Front Matter

      Pages 237-237
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  3. Nanoscale materials processing with ion beams

    1. Nanocluster and Nanovoid Formation by Ion Implantation

      • Kai Nordlund, Juhani Keinonen
      Pages 239-249

    2. Plasma Etching and Integration with Nanoprocessing

      • Antti Nuottajärvi, Tarmo Suppula
      Pages 251-263

    3. Focused Ion Beam Machining and Deposition

      • Yongqi Fu, Lumin Wang
      Pages 265-290

    4. Box 8: Sample Preparation for Transmission Electron Microscopy Using a Focused Ion Beam

      • Lumin Wang, Yongqi Fu
      Pages 291-292

    5. Box 9: Integrated Circuit Chip Modification Using Focused Ion Beams

      • Yongqi Fu
      Pages 293-296

    6. Proton Beam Writing: A New 3D Nanolithographic Technique

      • Jeroen A. van Kan, Andrew A. Bettiol
      Pages 297-310

    7. Box 10: Proton Beam Writing of Optical Structures

      • Andrew A. Bettiol
      Pages 311-314

    8. Box 11: Tissue Engineering and Bioscience Methods Using Proton Beam Writing

      • J.A. van Kan
      Pages 315-317

    9. Box 12: Stamps for Nanoimprint Lithography

      • J.A. van Kan, K. Ansari
      Pages 319-322

    10. Box 13: Silicon Micro/Nano-Fabrication Using Proton Beam Writing and Electrochemical Etching

      • Daniel J. Blackwood, Ee Jin Teo
      Pages 323-328

    11. Nanoscale Materials Modification for Device Applications

      • Robert G. Elliman
      Pages 329-355

    12. Luminescence, Ion Implantation, and Nanoparticles

      • Peter Townsend
      Pages 357-367

    13. Micro- and Nanoengineering with Ion Tracks

      • Christina Trautmann
      Pages 369-387

  4. Equipment and Practice

    1. Front Matter

      Pages 389-389
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  5. Equipment and practice

    1. Ion Accelerators for Nanoscience

      • Ragnar Hellborg, David Hole
      Pages 391-411

    2. Focusing keV and MeV Ion Beams

      • Mark Breese
      Pages 413-420

    3. Ion Spectrometers and Detectors

      • Tessica D.M. Weijers-Dall
      Pages 421-429

    4. Electronics for Application of Ion Beams in Nanoscience

      • Harry J. Whitlow
      Pages 431-439
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Keywords

About this book

Energetic ion beam irradiation is the basis of a wide plethora of powerful research- and fabrication-techniques for materials characterisation and processing on a nanometre scale. Materials with tailored optical, magnetic and electrical properties can be fabricated by synthesis of nanocrystals by ion implantation, focused ion beams can be used to machine away and deposit material on a scale of nanometres and the scattering of energetic ions is a unique and quantitative tool for process development in high speed electronics and 3-D nanostructures with extreme aspect radios for tissue engineering and nano-fluidics lab-on-a-chip may be machined using proton beams. This book will benefit practitioners, researchers and graduate students working in the field of ion beams and application and more generally everyone concerned with the broad field of nanoscience and technology.

Editors and Affiliations

  • Inst. Technology, University of Lund, Lund, Sweden

    Ragnar Hellborg

  • Dept. Physics, University of Jyväskylä, Jyväskylä, Finland

    Harry J. Whitlow

  • Pacific Northwest National Laboratory, Richland, U.S.A.

    Yanwen Zhang

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