Reactive Sputter Deposition

  • Diederik Depla
  • Stijn Mahieu

Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 109)

Table of contents

  1. Front Matter
    Pages i-xviii
  2. Tadayoshi Ono, Takahiro Kenmotsu, Tetsuya Muramoto
    Pages 1-42
  3. R. A. Baragiola, Pierfrancesco Riccardi
    Pages 43-60
  4. Annemie Bogaerts, Ivan Kolev, Guy Buyle
    Pages 61-130
  5. Sören Berg, Tomas Nyberg, Tomas Kubart
    Pages 131-152
  6. Diederik Depla, Stijn Mahieu, Roger De Gryse
    Pages 153-197
  7. Stijn Mahieu, Koen Van Aeken, Diederik Depla
    Pages 199-227
  8. Samuel D. Ekpe, Steven K. Dew
    Pages 229-254
  9. James W. Bradley, Thomas Welzel
    Pages 255-300
  10. Stephanos Konstantinidis, F. Gaboriau, M. Gaillard, M. Hecq, A. Ricard
    Pages 301-335
  11. Pascal Briois, Frédéric Lapostolle, Alain Billard
    Pages 367-411
  12. Haydn Wadley, Xiaowang Zhou, William H. Butler
    Pages 497-559
  13. Back Matter
    Pages 561-570

About this book


The use of thin films is continuously expanding. In the family of Physical Vapour Deposition techniques, sputtering is one of the most important over the past 40 years. In this book, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to:

- start with reactive magnetron sputtering

- understand and investigate the technique

- control their sputtering process

- tune their existing process, obtaining the desired thin films.


Helium-Atom-Streuung Magnetron discharge modelling Physical vapour deposition Plasma characterization and modelling Reactive magnetron sputtering Thin film growth thin films

Editors and affiliations

  • Diederik Depla
    • 1
  • Stijn Mahieu
    • 1
  1. 1.Department of Solid-State SciencesGent UniversityBelgium

Bibliographic information