Book 2006

Ion Implantation and Synthesis of Materials

Authors:

ISBN: 978-3-540-23674-0 (Print) 978-3-540-45298-0 (Online)

Table of contents (15 chapters)

  1. Front Matter

    Pages i-xiii

  2. No Access

    Chapter

    Pages 1-10

    General Features and Fundamental Concepts

  3. No Access

    Chapter

    Pages 11-21

    Particle Interactions

  4. No Access

    Chapter

    Pages 23-36

    Dynamics of Binary Elastic Collisions

  5. No Access

    Chapter

    Pages 37-48

    Cross-Section

  6. No Access

    Chapter

    Pages 49-61

    Ion Stopping

  7. No Access

    Chapter

    Pages 63-76

    Ion Range and Range Distribution

  8. No Access

    Chapter

    Pages 77-92

    Displacements and Radiation Damage

  9. No Access

    Chapter

    Pages 93-106

    Channeling

  10. No Access

    Chapter

    Pages 107-126

    Doping, Diffusion and Defects in Ion-Implanted Si

  11. No Access

    Chapter

    Pages 127-142

    Crystallization and Regrowth of Amorphous Si

  12. No Access

    Chapter

    Pages 143-158

    Si Slicing and Layer Transfer: Ion-Cut

  13. No Access

    Chapter

    Pages 159-178

    Surface Erosion During Implantation: Sputtering

  14. No Access

    Chapter

    Pages 179-192

    Ion-Induced Atomic Intermixing at the Interface: Ion Beam Mixing

  15. No Access

    Chapter

    Pages 193-211

    Application of Ion Implantation Techniques in CMOS Fabrication

  16. No Access

    Chapter

    Pages 213-238

    Ion implantation in CMOS Technology: Machine Challenges

  17. Back Matter

    Pages 239-263