Spectroscopy of Complex Oxide Interfaces

Photoemission and Related Spectroscopies

  • Claudia Cancellieri
  • Vladimir N. Strocov

Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 266)

Table of contents

  1. Front Matter
    Pages i-xiv
  2. C. Cancellieri, Vladimir N. Strocov
    Pages 1-16
  3. A. M. R. V. L. Monteiro, A. D. Caviglia, N. Reyren
    Pages 37-53
  4. Siobhan McKeown Walker, Flavio Y. Bruno, Felix Baumberger
    Pages 55-85
  5. Vladimir N. Strocov, Claudia Cancellieri, Andrey S. Mishchenko
    Pages 107-151
  6. Slavomír Nemšák, Alexander X. Gray, Charles S. Fadley
    Pages 153-179
  7. A. Filippetti
    Pages 181-213
  8. O. Janson, Z. Zhong, G. Sangiovanni, K. Held
    Pages 215-243
  9. M.-A. Husanu, C. A. F. Vaz
    Pages 245-281
  10. Back Matter
    Pages 315-320

About this book


This book summarizes the most recent and compelling experimental results for complex oxide interfaces. The results of this book were obtained with the cutting-edge photoemission technique at highest energy resolution. Due to their fascinating properties for new-generation electronic devices and the challenge of investigating buried regions, the book chiefly focuses on complex oxide interfaces. 

The crucial feature of exploring buried interfaces is the use of soft X-ray angle-resolved photoemission spectroscopy (ARPES) operating on the energy range of a few hundred eV to increase the photoelectron mean free path, enabling the photons to penetrate through the top layers – in contrast to conventional ultraviolet (UV)-ARPES techniques. The results presented here, achieved by different research groups around the world, are summarized in a clearly structured way and discussed in comparison with other photoemission spectroscopy techniques and other oxide materials. They are complemented and supported by the most recent theoretical calculations as well as results of complementary experimental techniques including electron transport and inelastic resonant X-ray scattering.



Photoemission Spectroscopy Transport properties of TMO interfaces soft X-ray ARPES Growth of TMO interfaces Hard X-ray photoelectron spectroscopy soft X-ray ARPES Complex Oxides Strongly Correlated Electrons

Editors and affiliations

  • Claudia Cancellieri
    • 1
  • Vladimir N. Strocov
    • 2
  1. 1.Empa—Swiss Federal Laboratories for Materials Science and TechnologyDübendorfSwitzerland
  2. 2.Spectroscopy of Novel Materials GroupPaul Scherrer InstituteVilligenSwitzerland

Bibliographic information