Chemical Solution Deposition of Functional Oxide Thin Films

  • Theodor Schneller
  • Rainer Waser
  • Marija Kosec
  • David Payne

Table of contents

  1. Front Matter
    Pages i-xvii
  2. Solution Chemistry

    1. Front Matter
      Pages 1-2
    2. Theodor Schneller
      Pages 3-28
    3. Theodor Schneller, David Griesche
      Pages 29-49
    4. Barbara Malič, Sebastjan Glinšek, Theodor Schneller, Marija Kosec
      Pages 51-69
    5. Vadim G. Kessler
      Pages 71-92
    6. Marlies K. Van Bael, An Hardy, Jules Mullens
      Pages 93-140
    7. Anthony K. Burrell, Thomas M. McCleskey, Quanxi Jia
      Pages 141-158
  3. Analytical Methods

    1. Front Matter
      Pages 159-161
    2. Barbara Malič, Alja Kupec, Marija Kosec†
      Pages 163-179
    3. Irene Schlipf, Matthias Bauer, Helmut Bertagnolli
      Pages 181-212
    4. Maria Zaharescu, Oana Cătălina Mocioiu
      Pages 213-230
  4. Deposition Techniques

    1. Front Matter
      Pages 231-232
    2. C. Jeffrey Brinker
      Pages 233-261
    3. Dunbar P. Birnie III
      Pages 263-274
    4. Matt D. Brubaker
      Pages 275-302
    5. Paul G. Clem, Nelson S. Bell
      Pages 303-318
    6. Mark R. De Guire, Luciana Pitta Bauermann, Harshil Parikh, Joachim Bill
      Pages 319-339
  5. Processing and Crystallization

    1. Front Matter
      Pages 341-342
    2. Robert W. Schwartz, Manoj Narayanan
      Pages 343-382
    3. Fred Lange
      Pages 383-405
    4. Susanne Hoffmann-Eifert, Theodor Schneller
      Pages 407-429
    5. Sebastjan Glinšek, Barbara Malič, Marija Kosec
      Pages 431-444
    6. Robert Dorey, Subhasis Roy, A. Sharma, Chandan Ghanty, Subhasish B. Majumder
      Pages 445-482
    7. Kiyoharu Tadanaga, Mohammad S. M. Saifullah
      Pages 483-515
    8. Sven Clemens, Theodor Schneller
      Pages 517-539
  6. Functions and Applications

    1. Front Matter
      Pages 541-545
    2. Hiroyuki Kambara, Theodor Schneller, Rainer Waser
      Pages 547-570
    3. Jon F. Ihlefeld, Mark D. Losego, Jon-Paul Maria
      Pages 571-592
    4. Camilla Haavik, Per Martin Rørvik
      Pages 621-654
    5. Peer Löbmann
      Pages 655-672
    6. Michael Bäcker, Martina Falter, Oliver Brunkahl, Bernhard Holzapfel
      Pages 673-705
    7. Peer Löbmann
      Pages 707-724
  7. Back Matter
    Pages 747-796

About this book


This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered


Chemical Solution Deposition Functional Oxide Films

Editors and affiliations

  • Theodor Schneller
    • 1
  • Rainer Waser
    • 2
  • Marija Kosec
    • 3
  • David Payne
    • 4
  1. 1.RWTH Aachen UniversityAachenGermany
  2. 2.RWTH Aachen UniversityAachenGermany
  3. 3.Jožef Stefan InstituteLjubljanaSlovenia
  4. 4.University of Illinois at Urbana-ChampaiUrbanaUSA

Bibliographic information