Lecture Notes on Principles of Plasma Processing

  • Francis F. Chen
  • Jane P. Chang

Table of contents

  1. Front Matter
    Pages i-ix
  2. Francis F. Chen, Jane P. Chang
    Pages 1-3
  3. Francis F. Chen, Jane P. Chang
    Pages 3-10
  4. Francis F. Chen, Jane P. Chang
    Pages 11-24
  5. Francis F. Chen, Jane P. Chang
    Pages 25-30
  6. Francis F. Chen, Jane P. Chang
    Pages 31-46
  7. Francis F. Chen, Jane P. Chang
    Pages 47-49
  8. Francis F. Chen, Jane P. Chang
    Pages 49-60
  9. Francis F. Chen, Jane P. Chang
    Pages 61-69
  10. Francis F. Chen, Jane P. Chang
    Pages 69-74
  11. Francis F. Chen, Jane P. Chang
    Pages 75-75
  12. Francis F. Chen, Jane P. Chang
    Pages 75-79
  13. Francis F. Chen, Jane P. Chang
    Pages 79-93
  14. Francis F. Chen, Jane P. Chang
    Pages 93-97
  15. Francis F. Chen, Jane P. Chang
    Pages 99-100
  16. Francis F. Chen, Jane P. Chang
    Pages 100-102
  17. Francis F. Chen, Jane P. Chang
    Pages 103-109
  18. Francis F. Chen, Jane P. Chang
    Pages 109-119
  19. Francis F. Chen, Jane P. Chang
    Pages 119-123
  20. Francis F. Chen, Jane P. Chang
    Pages 125-126

About this book

Introduction

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes.

This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Keywords

Plasma Vakuuminjektionsverfahren chemical engineering chemistry color dielectrics plasma physics semiconductor simulation

Authors and affiliations

  • Francis F. Chen
    • 1
  • Jane P. Chang
    • 2
  1. 1.Electrical Engineering DepartmentUniversity of CaliforniaLos AngelesUSA
  2. 2.Chemical Engineering DepartmentUniversity of CaliforniaLos AngelesUSA

Bibliographic information

  • DOI https://doi.org/10.1007/978-1-4615-0181-7
  • Copyright Information Kluwer Academic/Plenum Publishers, New York 2003
  • Publisher Name Springer, Boston, MA
  • eBook Packages Springer Book Archive
  • Print ISBN 978-0-306-47497-2
  • Online ISBN 978-1-4615-0181-7
  • About this book