Fundamentals and Applications of Anion Separations

  • Bruce A. Moyer
  • Raj P. Singh

Table of contents

  1. Front Matter
    Pages i-xvii
  2. Philip A. Gale
    Pages 1-30
  3. Hans-Jörg Schneider
    Pages 31-42
  4. Benjamin P. Hay, David A. Dixon, Gregg J. Lumetta, Rubicelia Vargas, Jorge Garza
    Pages 43-57
  5. Suzanne L. Tobey, Eric V. Anslyn
    Pages 59-69
  6. Jonathan L. Sessler, Bruno Andrioletti, Pavel Anzenbacher Jr., Chris Black, Leah Eller, Hiroyuki Furuta et al.
    Pages 71-85
  7. K. Travis Holman, Jerry L. Atwood
    Pages 87-105
  8. Gregg J. Lumetta
    Pages 107-114
  9. Joseph M. Mahoney, John P. Davis, Bradley D. Smith
    Pages 115-123
  10. Konstantinos Kavallieratos, Jeffrey C. Bryan, Richard A. Sachleben, Gary J. Van Berkel, Oscar D. Espetia, Melissa A. Kelly et al.
    Pages 125-150
  11. Holger Stephan, Karsten Gloe, Werner Kraus, Hartmut Spies, Bernd Johannsen, Kathrin Wichmann et al.
    Pages 151-168
  12. Spiro D. Alexandratos
    Pages 169-177
  13. Minoru Isshiki, Kouji Mimura, Tamas Kekesi
    Pages 207-223
  14. Eric Guibal, Javier Guzman, Ricardo Navarro, Montserrat Ruiz, Ana Sastre
    Pages 225-247
  15. Zdenek Matějka, Helena Parschová, Pavla Ruszová, Luděk Jelínek, Pavla Houserová, Eva Mištová et al.
    Pages 249-261
  16. Katsutoshi Inoue, Kedar Nath Ghimire, Rabindra Prasad Dhakal, Kenjiro Makino, Tohru Miyajima
    Pages 263-275
  17. Raj P. Singh
    Pages 325-339
  18. Back Matter
    Pages 341-358

About this book


This book documents the proceedings of the symposium "Fundamentals and Applications of Anion Separations" held during American Chemical Society National Meeting in Chicago, Illinois, August 25-30, 200I. Nearly 40 papers devoted to discussions on anion separation related to fundamental research and applications were presented. The symposium, sponsored by Osram Sylvania, BetzDearbom, and the Separation Science & Technology Subdivision of the Industrial & Engineering Chemistry Division of the American Chemical Society was organized by Bruce A. Moyer, Chemical Sciences Division, Oak Ridge National Laboratory, P.O. Box 2008, Building. 4500S, Oak Ridge, TN 37831-6119, and Raj P. Singh, Chemicals and Powders R&D, Osram Sylvania, Chemical and Metallurgical Products Division, Towanda, PA 18848. It drew presenters from Australia, the Czech Republic, France, Germany, Japan, South Africa, Thailand, the United Kingdom, and the United States. Separations constitute an integral part of chemical industry. Chemical products typically originate in resources that must be concentrated and purified, chemically transformed, and subjected to fmal purification. Effluent streams from the processes must be treated to recycle reusable components and to remove environmentally harmful species. Some industrial processes are devoted to environmental cleanup after pollution has occurred. In addition, many analytical methods require a separation for preconcentration, or a separation may be an inherent part of the analysis itself. Micro­ separations occurring at membranes or interfaces are also related phenomena employed for ion sensing. Many species targeted for separation are naturally anionic. Although the standard separations techniques ofextraction, ion exchange, adsorption, precipitation, etc.


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Editors and affiliations

  • Bruce A. Moyer
    • 1
  • Raj P. Singh
    • 2
  1. 1.Oak Ridge National LaboratoryOak RidgeUSA
  2. 2.Osram SylvaniaTowandaUSA

Bibliographic information

  • DOI
  • Copyright Information Springer Science+Business Media New York 2004
  • Publisher Name Springer, Boston, MA
  • eBook Packages Springer Book Archive
  • Print ISBN 978-1-4613-4742-2
  • Online ISBN 978-1-4419-8973-4
  • Buy this book on publisher's site