Abstract
This paper reports the deposition of a metal line using a multilayer stack and laser-induced forward transfer (LIFT) using a low cost continuous wave blue laser with a wavelength of 450 nm. The donor structure was composed of a light-to-heat (LTH) layer, a release layer, and a transfer layer in series. Amorphous silicon as the LTH layer absorbs photon energy and converts it to heat. A release layer was melted so that a silver transfer layer would be transferred to the receiver substrate. The transferred silver layer showed reasonable physical and electrical characteristics. A low cost fine linewidth metal layer could be achieved using this modified LIFT technique and blue laser.
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Cheon, J., Nguyen, MC., Nguyen, A.HT. et al. Deposition of Fine Linewidth Silver Layer using a Modified Laser-induced Forward Transfer Technique. J. Korean Phys. Soc. 73, 1279–1282 (2018). https://doi.org/10.3938/jkps.73.1279
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DOI: https://doi.org/10.3938/jkps.73.1279