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Fabrication of BIT thick films patterned by proton beam writing

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Abstract

In this study, we fabricated thick films with polyvinylpyrrolidone (PVP) added to bismuth titanate (Bi4Ti3O12) to form a lead-free ferroelectric material. We examined the direct patterning of these materials by using proton-beam irradiation. When 50% PVP was added to the organic source solution, the c-axis orientation was promoted and cracks were suppressed due to stress relaxation. In addition, a dot and an arbitrary-shape micro-pattern were formed on bismuth-titanate thick film by micromachining using a proton beam.

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Authors and Affiliations

  1. Department of Electronics Engineering, Faculty of Engineering, Shibaura Institute of Technology, Tokyo, 135-8548, Japan

    Masaki Yamaguchi & Kazuki Watanabe

  2. Department of Electric Engineering, Faculty of Engineering, Shibaura Institute of Technology, Tokyo, 135-8548, Japan

    Hiroyuki Nishikawa

  3. Department of Electric and Electronic Systems, Faculty of Engineering, Hachinohe Institute of Technology, Aomori, 031-8501, Japan

    Yoichiro Masuda

Authors
  1. Masaki Yamaguchi
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  2. Kazuki Watanabe
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  3. Hiroyuki Nishikawa
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  4. Yoichiro Masuda
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Correspondence to Masaki Yamaguchi.

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Yamaguchi, M., Watanabe, K., Nishikawa, H. et al. Fabrication of BIT thick films patterned by proton beam writing. Journal of the Korean Physical Society 71, 88–91 (2017). https://doi.org/10.3938/jkps.71.88

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  • DOI: https://doi.org/10.3938/jkps.71.88

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