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Growth of epitaxial TiN (111) thin films with low resistivity on Si (111) by crossed-beam pulsed laser deposition

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Abstract

Titanium nitride (TiN) thin films were grown epitaxially on Si (111) substrates by reactive pulsed laser deposition. Substrate temperatures ranged from 550 to 950 °C while plume kinetic energies ranged from 46 to 154 eV. Quality of the grown films depended strongly on kinetic energy of the films than the growth temperatures. High quality film was grown at 750 °C with a laser plume kinetic energy of ~ 92 eV. Full width at half maximum for a ω-scan around the TiN (111) peak and a φ-scan through the TiN (002) peak were 0.3° and 0.43 °, respectively. The resistivity of the films was increased with increased temperatures and a room temperature resistivity of 3.8 μΩ-cm was obtained.

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Authors and Affiliations

  1. Institute of Photonics, Electronics, and Information, Department of Physics, Chonbuk National University, Jeonju, 54896, Korea

    Sukill Kang

  2. Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee, 37831, USA

    C. M. Rouleau

Authors
  1. Sukill Kang
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  2. C. M. Rouleau
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Correspondence to Sukill Kang.

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Kang, S., Rouleau, C.M. Growth of epitaxial TiN (111) thin films with low resistivity on Si (111) by crossed-beam pulsed laser deposition. Journal of the Korean Physical Society 71, 111–115 (2017). https://doi.org/10.3938/jkps.71.111

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  • DOI: https://doi.org/10.3938/jkps.71.111

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