Abstract
For plasma surface treatments at atmospheric pressure, a 2 kW dielectric barrier discharge (DBD) source was developed. It was investigated via an optical emission spectroscopy (OES), an IR camera and volt-ampere meters with a computer. It was confirmed that the developed source stably generated plasmas. After the diamonds had been seeded, the plasma surface treatments were performed as pretreatment to improve the deposition of the diamond films by using the developed DBD source with argon gas. The substrate surfaces were analyzed using a contact angle analysis (CAA), an atomic force microscopy (AFM) and a 3D Nano Profiling System. The results of the plasma surface treatments showed an improvement in the surface free energies of the substrates. The plasma surface treatments for 5 minutes also resulted in a more uniform distribution of the seeding diamonds on the substrates, which improved the depositions of the diamond films.
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References
G. F. Ding, H. P. Mao, Y. L. Cai, Y. H. Zhang, X. Yao and X. L. Zhao, Diam. Relat. Mat. 14, 1543 (2005).
T. Lamara, M. Belmahi, O. Elmazria, L. Le Brizoual, J. Bougdira, M. Remy and P. Alnot, Diam. Relat. Mat. 13, 581 (2004).
C. Manfredotti, Diam. Relat. Mat. 14, 531 (2005).
X. L. Peng, Z. H. Barber and T. W. Clyne, Surf. Coat. Technol. 138, 23 (2001).
Z. Sun, J. Non-Cryst. Solids 261, 211 (2000).
S.-S. Tzeng, Y.-J. Wu and J.-S. Hsu, Vacuum 83, 618 (2009).
H. Liu and D. S. Dandy, Diamond Chemical Vapor Deposition: Nucleation and Early Growth Stage (Noyes Publications, Park Ridge, 1995), p. 103.
E. R. Ionita, M. D. Ionita, E. C. Stancu, M. Teodorescu and G. Dinescu, Appl. Surf. Sci. 255, 5448 (2009).
C. Wang, G. Zhang, X. Wang and X. He, Appl. Surf. Sci. 257, 1698 (2010).
C. Fournier, O. Bamiduro, H. Mustafa, R. Mundle, R. B. Konda, F. Williams and A. K. Pradhan, Semicond. Sci. Technol. 23, 085019 (2008).
J. G. Bhak, C. Kim, I. Rhee and H. T. Kim, J. Korean Phys. Soc. 62, 258 (2013).
A. Yanguas-Gil, K. Focke, J. Benedikit and A. von Keudell, J. Appl. Phys. 101, 103307 (2007).
A. Sarani, A. Yu. Nikiforov and C. Leys, Phys. Plasmas 17, 063504 (2010).
J. H. Choi, T. I. Lee, I. Han, H. K. Baik, K. M. Song, Y. S. Lim and E. S. Lee, Plasma Sources Sci. Technol. 15, 416 (2006).
V. I. Konov, A. A. Smolin, V. G. Ralchenko, S. M. Pimenov, E. D. Obraztsova, E. N. Loubnin, S. M. Metev and G. Sepold, Diam. Relat. Mat. 4, 1073 (1995).
D. K. Owens and R. C. Wendt, J. Appl. Polym. Sci. 13, 1769 (1969).
D. Y. Kwok, C. N. C. Lam, A. Li, A. Leung, R. Wu, E. Mok and A. W. Neumann, Colloid Surf. A-Physicochem. Eng. Asp. 142, 219 (1998)
S. Tang, O.-J. Kwon, N. Lu and H.-S. Choi, Surf. Coat. Technol. 195, 298 (2005).
L. Carrino, G. Moroni and W. Polini, J. Mater. Process. Technol. 121, 373 (2002).
J. H. Lee, K. S. Hwang, T. S. Kim, J. W. Seong, K. H. Yoon and S. Ahn, J. Korean Phys. Soc. 44, 1171 (2004).
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Kang, I.J., Ko, M.G., Yang, J.K. et al. Plasma surface treatments by using a dielectric barrier discharge for the deposition of diamond films. Journal of the Korean Physical Society 63, 199–205 (2013). https://doi.org/10.3938/jkps.63.199
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DOI: https://doi.org/10.3938/jkps.63.199