Abstract
The thickness of the pellicle is only a few tens of microns in extreme ultraviolet lithography (EUVL). This is because the absorption loss by the pellicle is high. Thus, the thickness and contamination on the surface of the EUVL pellicle are important factors for controlling the transmission of EUV light. In this work, we fabricate ultra-thin silicon-nitride membranes for EUVL pellicles and use micro-spot spectroscopic ellipsometry and imaging ellipsometry for characterization. We successfully deduce not only the thickness but also the optical function of the membrane. However, we found that some precautions were required for accurate measurement of the free-standing thin membranes by using ellipsometry. Issues related to the vibration of the membrane and the sensitivity of the measurement are discussed.
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Park, S., Lee, C., An, I. et al. Characterization of Free-Standing Nano-Membranes by Using Ellipsometry. J. Korean Phys. Soc. 72, 868–872 (2018). https://doi.org/10.3938/jkps.72.868
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DOI: https://doi.org/10.3938/jkps.72.868