Abstract
Fluctuations of the semiconductor surface potential in a Si-SiO2 structure, caused by irradiation with different high-energy particles (50 MeV electrons and 40 keV arsenic ions) and subsequent annealing, have been studied by measuring the semiconductor interface state parameters. It is established that the fluctuation of the semiconductor surface potential decreases slightly, from 0.049 V to 0.044 V, after irradiation, while a considerable increase is observed after annealing. For the samples irradiated by arsenic ions, the increase in fluctuation is much larger (0.096 V) than that for the electron-irradiated samples (0.06 V).
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Original Russian Text © A.A. Sahakyan, 2007, published in Izvestiya NAN Armenii, Fizika, 2007, Vol. 42, No. 6, pp. 382–388.
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Sahakyan, A.A. Fluctuation of semiconductor surface potential in Si-SiO2 structure after irradiation and subsequent annealing. J. Contemp. Phys. 42, 252–255 (2007). https://doi.org/10.3103/S1068337207060084
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DOI: https://doi.org/10.3103/S1068337207060084