Abstract
The results of the study of the effect of thermal annealing and diffusion on the structure of a porous silicon film formed by metal-assisted etching on a single-crystal silicon substrate are presented. The porous silicon film surface is studied by scanning electron microscopy and Raman scattering spectroscopy.
It is shown that thermal treatment modes affect the morphology of porous silicon films on micro- and nanometer scales.
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Translated by A. Kazantsev
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Melnik, N.N., Tregulov, V.V., Skoptsova, G.N. et al. Effect of Heat Treatment Conditions on the Structural Features of Porous Silicon Films Formed by Metal-Assisted Etching. Bull. Lebedev Phys. Inst. 50, 486–490 (2023). https://doi.org/10.3103/S1068335623110076
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DOI: https://doi.org/10.3103/S1068335623110076