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Effect of the Thickness of Passivating Reactive Titanium Layer of Mirror Faces on the Electric Characteristics of Diode Lasers

  • CONTROL OF LASER RADIATION PARAMETERS
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Abstract

The method for determining the admissible thickness of titanium layer for passivating the radiating faces of diode laser is described. Passivation by reactive metal can be easily introduced into the production process of diode lasers. As a reactive metal titanium was chosen, because it serves as adhesive layer of ohmic contacts of semiconductor structures. It is shown how the I–V curve of the diode laser tends to the shape before the coating deposition as the layer of the deposited titanium decreases from 4.3 to 0.7 nm.

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Authors and Affiliations

  1. OOO Lassard, 249032, Obninsk, Kaluga oblast, Russia

    N. S. Utkov & G. T. Mikaelyan

  2. Lebedev Physical Institute, Russian Academy of Sciences, 119991, Moscow, Russia

    A. E. Drakin

  3. OOO NPP Inzhekt, 410033, Saratov, Russia

    G. T. Mikaelyan

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  1. N. S. Utkov
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  2. A. E. Drakin
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  3. G. T. Mikaelyan
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Correspondence to N. S. Utkov.

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Translated by E. Oborin

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Utkov, N.S., Drakin, A.E. & Mikaelyan, G.T. Effect of the Thickness of Passivating Reactive Titanium Layer of Mirror Faces on the Electric Characteristics of Diode Lasers. Bull. Lebedev Phys. Inst. 49 (Suppl 1), S53–S57 (2022). https://doi.org/10.3103/S1068335622130139

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  • DOI: https://doi.org/10.3103/S1068335622130139

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