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Emission Theory of the Sputtering of Amorphous Materials: Self-Sputtering

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Bulletin of the Russian Academy of Sciences: Physics Aims and scope

Abstract

The dependences of the coefficient of self-sputtering on the type of accelerated ions, their energy, and the angle of incidence on a target are calculated. Satisfactory coincidence between the calculated and experimental results is obtained for С–С and W–W systems. Two mechanisms of the entry of secondary particles into a flow of sputtered atoms are proposed.

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Authors and Affiliations

  1. Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences, Chernogolovka, Moscow oblast, 142432, Russia

    A. N. Pustovit

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  1. A. N. Pustovit
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Correspondence to A. N. Pustovit.

Additional information

Original Russian Text © A.N. Pustovit, 2018, published in Izvestiya Rossiiskoi Akademii Nauk, Seriya Fizicheskaya, 2018, Vol. 82, No. 2, pp. 166–170.

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Pustovit, A.N. Emission Theory of the Sputtering of Amorphous Materials: Self-Sputtering. Bull. Russ. Acad. Sci. Phys. 82, 145–149 (2018). https://doi.org/10.3103/S106287381802020X

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  • DOI: https://doi.org/10.3103/S106287381802020X

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