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Effect of technological factors on the micromagnetic states of magnetic nanostructures

  • O. S. TrushinEmail author
  • V. V. Naumov
  • N. I. Barabanova
  • V. F. Bochkarev
Proceedings of the International Symposium “Nanophysics and Nanoelectronics-2013”

Abstract

The results from experimental and theoretical studies of the effect of technological factors on the micromagnetic states of multilayer magnetoresistive structures are presented. Spin-valve structures are deposited via magnetron sputtering. The resulting experimental samples were characterized using Kerr effect microscopy. A theoretical analysis of the effect of technological imperfections on hysteresis loop of such structures is performed by means of micromagnetic modeling.

Keywords

Magnetic Reversal Magnetic Layer Spin Valve Nonmagnetic Layer Exchange Bias Effect 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Allerton Press, Inc. 2014

Authors and Affiliations

  • O. S. Trushin
    • 1
    Email author
  • V. V. Naumov
    • 1
  • N. I. Barabanova
    • 2
  • V. F. Bochkarev
    • 1
  1. 1.Institute of Physics and Technology, Yaroslavl BranchRussian Academy of SciencesYaroslavlRussia
  2. 2.Yaroslavl Demidov State UniversityYaroslavlRussia

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