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Electron beam lithography with a Gaussian current distribution for nanolithography

  • Proceedings of the XVII Russian Symposium on Scanning Electron Microscopy and Analytical Methods of Investigation Applied for Solid States Physics
  • Published:
Bulletin of the Russian Academy of Sciences: Physics Aims and scope

Abstract

The parameters of a system of electron beam lithography with a Gaussian current density distribution are studied. The dependence of resolution on magnification and the ratio of anode potentials are analyzed. A model of a three-electrode electron gun with a ZrO/W cathode is used. Stochastic aberration is taken into account. It is shown that a resolution of 10 nm is obtainable even if an electron gun with the simplest geometry is used.

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Correspondence to O. D. Potapkin.

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Original Russian Text © O.D. Potapkin, 2012, published in Izvestiya Rossiiskoi Akademii Nauk. Seriya Fizicheskaya, 2012, Vol. 76, No. 9, pp. 1103–1106.

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Potapkin, O.D. Electron beam lithography with a Gaussian current distribution for nanolithography. Bull. Russ. Acad. Sci. Phys. 76, 991–994 (2012). https://doi.org/10.3103/S1062873812090201

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  • DOI: https://doi.org/10.3103/S1062873812090201

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