Abstract
The parameters of a system of electron beam lithography with a Gaussian current density distribution are studied. The dependence of resolution on magnification and the ratio of anode potentials are analyzed. A model of a three-electrode electron gun with a ZrO/W cathode is used. Stochastic aberration is taken into account. It is shown that a resolution of 10 nm is obtainable even if an electron gun with the simplest geometry is used.
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Melnikov, A.A. and Potapkin, O.D., Bull. Russ. Acad. Sci. Phys., 2010, vol. 74, no. 7, p. 1011.
Der-Shvarts, G.V. and Makarova, I.S., Radiot. Elektr., 1969, no. 14, p. 378.
Orloff, J. and Swanson, L.W., J. Appl. Phys., 1979, vol. 50, no. 4, p. 2494.
Swanson, L.W. and Schwind, G.A., Handbook of Charged Particle Optics, Orloff, J., New York: CRC Press, 1997.
Piearce-Percy, H., et al., J. Vac. Sci. Tecnol. B, 1997, vol. 15, no. 6, p. 2754.
Veneklasen, L., in Physical Aspects of Electron Microscopy, Siegel, B. and Beaman, D.R., Eds., New York: Wiley, 1975, p. 315.
Hawkes, P.W. and Kasper, E., Principles of Electron Optics, London: Acad. Press, 1989; Moscow: Mir, 1993.
Panteleev, A.V. and Letova, T.A., Metody optimizatsii v primerakh i zadachakh (Optimization Methods in Problems and Examples), Moscow: Vysshaya shkola, 2002.
Press, W.H., Teukolsky, S.A., Vetterling, W.T., and Flannery, B.P., Numerical Recipes in C, Cambridge: Univ. Press, 1992.
Potapkin, O.D., Proc. SPIE-Int. Soc. Opt. Eng., 2008, vol. 7121, p. 712108.
Rusterholz, A.A., Elektronenoptik, Basel: Birkhauser, 1950; Moscow: Izd. inostr. lit, 1952, p. 46.
Lenc, M. and Müllerova, I., Ultramicroscopy, 1992, vol. 41, no. 4, p. 411.
Werster, J.L., Philips, Res.Rep., 1963, vol. 18, no. 6, p. 465.
Szilagyi, M., Electron and Ion Optics, New York: Plenum, 1988; Moscow: Mir, 1990.
Jansen, G.H., Coulomb Interactions in Particle Beams, Adv. Electron. Electron Phys., New York: Acad. Press, 1990, suppl. 21.
Kruit, P. and Jansen, G.H., in Handbook of Charged Particle Optics, Orloff, J., Ed., New York: CRC Press, 1997.
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Original Russian Text © O.D. Potapkin, 2012, published in Izvestiya Rossiiskoi Akademii Nauk. Seriya Fizicheskaya, 2012, Vol. 76, No. 9, pp. 1103–1106.
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Potapkin, O.D. Electron beam lithography with a Gaussian current distribution for nanolithography. Bull. Russ. Acad. Sci. Phys. 76, 991–994 (2012). https://doi.org/10.3103/S1062873812090201
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DOI: https://doi.org/10.3103/S1062873812090201