Automating the mode of the electron-probe control of templates for imprint lithography
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Problems of selecting the optimum parameters of electron-probe systems when scanning areas on the order of 1 cm2 with resolutions of 3–20 nm and the real-time control of these parameters during scanning are considered. The obtained dependences open the possibility of solving certain problems in fully automating the acquisition of information.
KeywordsFocal Point Electron Probe Local Contrast Horizontal Coordinate Locus Tion
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- 2.Lencova, B. and Zlamal, J., Electron Optical Design Program (EOD) Ver. 3.69, 2009.Google Scholar