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Automating the mode of the electron-probe control of templates for imprint lithography

  • V. V. KazmirukEmail author
  • T. N. Savitskaya
Proceedings of the XVII Russian Symposium on Scanning Electron Microscopy and Analytical Methods of Investigation Applied for Solid States Physics

Abstract

Problems of selecting the optimum parameters of electron-probe systems when scanning areas on the order of 1 cm2 with resolutions of 3–20 nm and the real-time control of these parameters during scanning are considered. The obtained dependences open the possibility of solving certain problems in fully automating the acquisition of information.

Keywords

Focal Point Electron Probe Local Contrast Horizontal Coordinate Locus Tion 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 1.
    Kazmiruk, V.V. and Savitskaya, T.N., Bull. Russ. Acad. Sci. Phys., 2001, vol. 75, no. 9, p. 1194.CrossRefGoogle Scholar
  2. 2.
    Lencova, B. and Zlamal, J., Electron Optical Design Program (EOD) Ver. 3.69, 2009.Google Scholar
  3. 3.
    Kazmiruk, V.V. and Savitskaya, T.N., Bull. Russ. Acad. Sci. Phys., 2010, vol. 7, no. 9, p. 988.CrossRefGoogle Scholar

Copyright information

© Allerton Press, Inc. 2012

Authors and Affiliations

  1. 1.Institute of Microelectronic Technology and Materials of Ultrahigh PurityRussian Academy of SciencesChernogolovka, Moscow oblastRussia

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