Abstract
A modified method for the magnetron deposition of heterostructures on single-crystal substrates that combines a high degree of efficiency and a high production rate is developed. Grown structures are simulated within the density functional theory to determine the most stable atomic positions in the InN/Si and GaN/Si interfaces.
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Kim, J.W., Yeom, H.W., Kong, K.J., et al., Phys. Rev. Lett., 2003, vol. 90, p. 106101.
Rawdanowicz, T.A. and Narayan, J., Appl. Phys. Lett., 2004, vol. 85, pp. 133–135.
Guo, Q., Ogata, M., Ding, Y., et al., J. Crystal Growth, 2009, vol. 311, no. 10, pp. 2783–2786.
Blochl, P.E., Phys. Rev. B, 1994, vol. 50, pp. 17953–17979.
Kresse, G. and Furthmuller, J., Phys. Rev. B, 1996, vol. 54, no. 16, pp. 11169–11186.
Monkhorst, H. and Pack, J., Phys. Rev. B, 1976, vol. 13, no. 12, pp. 5188–5192.
Stampfl, C., Van de Walle, C.G., Vogel, D., et al., Phys. Rev. B, 2000, vol. 61, no. 12, pp. R7846–R7849.
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Original Russian Text © K.K. Abgaryan, D.I. Bazhanov, S.Yu. Mikheev, I.V. Mutigullin, Yu.A. Ryzhov, 2012, published in Izvestiya Rossiiskoi Akademii Nauk. Seriya Fizicheskaya, 2012, Vol. 76, No. 6, pp. 777–779.
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Abgaryan, K.K., Bazhanov, D.I., Mikheev, S.Y. et al. Computer simulation and experimental investigation of the crystal structure and electronic properties of InN/Si and GaN/Si thin films. Bull. Russ. Acad. Sci. Phys. 76, 696–698 (2012). https://doi.org/10.3103/S1062873812060032
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DOI: https://doi.org/10.3103/S1062873812060032