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Effect of correlation of interacting particle masses on metal and compound sputtering

  • Proceedings of the XIX International Conference “Ion-Surface Interaction (ISI-2009)” (Zvenigorod, August 2009)
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Bulletin of the Russian Academy of Sciences: Physics Aims and scope

Abstract

The dependence of sputtering coefficients of polycrystals of some metals and binary compositions on the mass of bombarding ions with the energies in the range 200–2000 eV was studied by the molecular dynamics technique. The dependence of sputtering on target parameters was investigated. Targets with both similar and different densities, lattice constants, and surface binding energies were considered. Sputtering coefficients, source depths, mean energies, and the number of sputtered particle generations were calculated. Peculiarities of the obtained dependences are explained.

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Authors and Affiliations

  1. Moscow State University, Moscow, 119992, Russia

    S. S. Elovikov, E. Yu. Zykova & V. E. Yurasova

Authors
  1. S. S. Elovikov
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  2. E. Yu. Zykova
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  3. V. E. Yurasova
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Corresponding author

Correspondence to E. Yu. Zykova.

Additional information

Original Russian Text © S.S. Elovikov, E.Yu. Zykova, V.E. Yurasova, 2010, published in Izvestiya Rossiiskoi Akademii Nauk. Seriya Fizicheskaya, 2010, Vol. 74, No. 2, pp. 147–152.

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Elovikov, S.S., Zykova, E.Y. & Yurasova, V.E. Effect of correlation of interacting particle masses on metal and compound sputtering. Bull. Russ. Acad. Sci. Phys. 74, 130–135 (2010). https://doi.org/10.3103/S1062873810020073

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  • DOI: https://doi.org/10.3103/S1062873810020073

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