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Processes on the target surface under vanadium reactive sputtering in Ar-O2 mixtures

  • Proceedings of the International Symposium “Low-Dimensional Systems and Surfaces” (LDS-2008), Proceedings of the International Symposium “Orderings in Minerals and Alloys” (OMA-11) and Proceedings of the International Symposium “Order, Disorder,
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Bulletin of the Russian Academy of Sciences: Physics Aims and scope

Abstract

Experimental realization of the hysteresis-free mode of vanadium reactive magnetron sputtering in Ar-O2 mixtures made it possible to perform detailed measurements of the discharge current-voltage characteristics for the first time. They appeared to be not smooth, as predicted by the existing model of reactive sputtering, but having a kink. The experimental data can be interpreted on the assumption that the target surface is oxidized at a depth not less than two monolayers at low ion current densities.

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References

  1. Steenbeck, K., Steinbeiß, E., and Ufert, K.-D., Thin Solid Films, 1982, vol. 92, p. 371.

    Article  ADS  Google Scholar 

  2. Berg, S. and Nyberg, T., Thin Solid Films, 2005, vol. 476, p. 215.

    Article  ADS  Google Scholar 

  3. Matsuda, Y., Otomo, K., and Fujiyama, H., Thin Solid Films, 2001, vol. 390, p.59.

    Article  ADS  Google Scholar 

  4. Kusano, E., J. Appl. Phys., 1991, vol. 70, p. 7089.

    Article  ADS  Google Scholar 

  5. Wruck, D., Ramamurthy, S., and Rubin, M., Thin Solid Films, 1989, vol. 182, p.79.

    Article  ADS  Google Scholar 

  6. Theil, J., Kusano, E., and Rocket, A., Thin Solid Films, 1997, vol. 298, p. 122.

    Article  ADS  Google Scholar 

  7. Thornton, J.A. and Penfold, A., Thin Film Processes. Chapter II-2, New York: Academic, 1978.

    Google Scholar 

  8. Ziegler, J.F., Biersack, J.P., and Littmark, V., The Stopping and Range of Ions in Solids, New York: Pergamon, 1985.

    Google Scholar 

  9. Kucher, T.I., Fiz. Tverd. Tela, 1961, vol. 3, p. 546.

    Google Scholar 

  10. Qing, M. and Rosenberg, R., Appl. Surf. Sci., 2003, vol. 206, p. 209.

    Article  Google Scholar 

  11. Ronay, M. and Norlander, P., Phys. Rev. B, 1987, vol. 35, p. 9403.

    Article  ADS  Google Scholar 

Download references

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Authors and Affiliations

  1. Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences, Chernogolovka, Moscow oblast, 142432, Russia

    V. A. Marchenko

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  1. V. A. Marchenko
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Correspondence to V. A. Marchenko.

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Original Russian Text © V.A. Marchenko, 2009, published in Izvestiya Rossiiskoi Akademii Nauk. Seriya Fizicheskaya, 2009, Vol. 73, No. 7, pp. 920–923.

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Marchenko, V.A. Processes on the target surface under vanadium reactive sputtering in Ar-O2 mixtures. Bull. Russ. Acad. Sci. Phys. 73, 867–870 (2009). https://doi.org/10.3103/S1062873809070016

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  • DOI: https://doi.org/10.3103/S1062873809070016

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