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Comparison of image characteristics in projection photolithography

  • Materials of Xi All-Russian Seminar “Microwave Physics and Applications”
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Bulletin of the Russian Academy of Sciences: Physics Aims and scope

Abstract

The characteristics of images formed by some typical photomasks have been compared using numerical simulation. The technique for estimating the critical dimensions of image elements has been considered. The dependences of the critical dimensions on the numerical aperture and coherence parameter for a light source with a circular aperture and for different types of photomasks have been analyzed.

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Authors and Affiliations

  1. Moscow State University, Leninskie gory, Moscow, 119992, Russia

    G. V. Belokopytov & Yu. V. Ryzhikova

Authors
  1. G. V. Belokopytov
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  2. Yu. V. Ryzhikova
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Corresponding author

Correspondence to G. V. Belokopytov.

Additional information

Original Russian Text © G.V. Belokopytov, Yu.V. Ryzhikova, 2008, published in Izvestiya Rossiiskoi Akademii Nauk. Seriya Fizicheskaya, 2008, Vol. 72, No. 1, pp. 88–91.

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Belokopytov, G.V., Ryzhikova, Y.V. Comparison of image characteristics in projection photolithography. Bull. Russ. Acad. Sci. Phys. 72, 78–81 (2008). https://doi.org/10.3103/S106287380801019X

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  • DOI: https://doi.org/10.3103/S106287380801019X

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