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Application of nanostructured silver film in multilayer contact system of Ti/Mo/Ag silicon photoconverters

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Abstract

In this article we have synthesized multilayer contact systems Ti/Ag and Ti/Mo/Ag with nanostructured silver films using two vacuum methods, namely the method of electron-beam evaporation and HF magnetron sputtering. Using the data of atomic force microscopy, X-ray diffraction and mass spectroscopy of the secondary neutrals in the paper we have investigated the influence of the application method and of the annealing conditions on the grain formation processes in silver thin films and mass transfer between the metal layers of the contact system. The decrease of surface resistivity of the developed contacts and, respectively, the increase of short-circuit current of the heterojunction silicon solar cells have been determined.

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Correspondence to V. M. Koval.

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Original Russian Text © V.M. Koval, A.V. Ivashchuk, Y. Yakymenko, M.G. Dusheyko, Yu.V. Yasievich, G.S. Khrypunov, Ye.I. Sokol, 2016, published in Izv. Vyssh. Uchebn. Zaved., Radioelektron., 2016, Vol. 59, No. 2, pp. 4–13.

ORCID: 0000-0002-3898-9163

ORCID: 0000-0002-6448-5938

This publication was prepared with the support of the U.S. Civilian Research & Development Foundation (CRDF), grant No. UKP2-7040-KV-11.

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Koval, V.M., Ivashchuk, A.V., Yakymenko, Y. et al. Application of nanostructured silver film in multilayer contact system of Ti/Mo/Ag silicon photoconverters. Radioelectron.Commun.Syst. 59, 53–59 (2016). https://doi.org/10.3103/S0735272716020011

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  • DOI: https://doi.org/10.3103/S0735272716020011

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