Abstract
A simple analytical formula for the spectrum of spatial harmonic components of a diffracted field is derived. It is used for construction of an effective algorithm of image calculation in photolithography.
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References
J. W. Goodman, Introduction to Fourier Optics (Mir, Moscow, 1970) [in Russian].
D. C. Cole, E. Barouch, U. Hollebrach, and S. A. Orszang, J. Appl. Phys., No. 12, 4110 (1992).
G. V. Belokopytov and Yu. V. Korotkova, Vestnik MGU, Ser. Fiz.-Astr., No. 3, 44 (2007) [Moscow University Phys. Bull. 3, 44 (2007)].
P. Rai-Choudhuri, Handbook of Microlithography, Micromachining, and Microfabrication. Vol. 1. Microlithography (SPIE Optical Press, Bellingham, 1997).
M. Born and E. Wolf, Principles of Optics (Pergamon Press, London, 1965; Nauka, Moscow, 1970).
A. Ango, Mathematics for Electro- and Radio Engineers (Science, Moscow, 1967).
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Original Russian Text © G.V. Belokopytov, Yu.V. Ryzhikova, 2009, published in Vestnik Moskovskogo Universiteta. Fizika, 2009, No. 2, pp. 41–43.
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Belokopytov, G.V., Ryzhikova, Y.V. Fraunhofer diffraction on a polygon and calculation of binary mask images. Moscow Univ. Phys. 64, 146–148 (2009). https://doi.org/10.3103/S0027134909020106
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DOI: https://doi.org/10.3103/S0027134909020106