Surface Engineering and Applied Electrochemistry

, Volume 54, Issue 6, pp 593–598 | Cite as

Properties of Tin Films Electrodeposited under a Weak Magnetic Field

  • S. V. KovalyovEmail author
  • O. B. Girin
  • C. Debiemme-Chouvy


The cathodic deposition of tin coatings was performed from a sulfuric acid solution containing solely tin(II) sulfate, under a continuous external magnetic field. The influence of this magnetic field on the electrodeposition process, morphology and physical-mechanical properties of the tin film is reported. The morphology of the coatings was observed by scanning electron microscopy. It is shown that the tin electrodeposited under a weak (from 0.0005 to 0.0025 T) magnetic field has changed its surface morphology and physical- mechanical properties.


tin tin plating electrodeposition magnetic field physical-mechanical properties 


Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.


  1. 1.
    Schlesinger, M. and Paunovic, M., Modern Electroplating, Hoboken: Wiley, 2010, pp. 139–204.CrossRefGoogle Scholar
  2. 2.
    Rudnik, E., J. Ionics, 2013, vol. 19, pp. 1047–1059.CrossRefGoogle Scholar
  3. 3.
    Rudnik, E. and Wloch, G., Appl. Surf. Sci., 2013, vol. 265, pp. 839–849.CrossRefGoogle Scholar
  4. 4.
    Guaus, E. and Torrent-Burgues, J., Russ. J. Electrochem., 2006, vol. 42, pp. 141–146.CrossRefGoogle Scholar
  5. 5.
    Watt, C., Liu, Q., and Ivey, D.G., J. Mater. Sci.: Mater. Electron., 2013, vol. 24, pp. 827–837.Google Scholar
  6. 6.
    Jun, J., Lee, W., Jung, J.P., and Zhou, Y.N., Microelectron. Eng., 2012, vol. 93, pp. 85–90.CrossRefGoogle Scholar
  7. 7.
    Chen, X., Guo, J., Gerasopoulos, K., Langrock, A., et al., J. Power Sources, 2012, vol. 211, pp. 129–132.CrossRefGoogle Scholar
  8. 8.
    Ui, K., Kikuchi, S., Kadoma, Y., Kumagai, N., et al., J. Power Sources, 2009, vol. 189, pp. 224–229.CrossRefGoogle Scholar
  9. 9.
    Deng, M.-J., Chen, P.-Y., Leong, T.-I., Sun, I.-W., et al., Electrochem. Commun., 2008, vol. 10, pp. 213–216.CrossRefGoogle Scholar
  10. 10.
    Han, C., Liu, Q., and Ivey, D.G., Electrochim. Acta, 2008, vol. 53, pp. 8332–8340.CrossRefGoogle Scholar
  11. 11.
    He, A., Liu, Q., and Ivey, D.G., J. Mater. Sci.: Mater. Electron., 2008, vol. 19, pp. 553–562. Scholar
  12. 12.
    Mockus Survila, Z., Kanapeckaite, S., and Stalnionis, G., J. Electroanal Chem., 2012, vol. 667, pp. 59–65.CrossRefGoogle Scholar
  13. 13.
    Low, C.T.J. and Walsh, F.C., Surf. Coat. Technol., 2008, vol. 202, pp. 1339–1349.CrossRefGoogle Scholar
  14. 14.
    Tachikawa, N., Serizawa, N., Katayama, Y., and Miura, T., Electrochim. Acta, 2008, vol. 53, pp. 6530–6534.CrossRefGoogle Scholar
  15. 15.
    Faust, J.W., Jr., J. Cryst. Growth, 1968, vols. 3–4, pp. 433–435.CrossRefGoogle Scholar
  16. 16.
    Dischee, C.A. and Mathers, F.C., J. Electrochem. Soc., 1955, vol. 102, pp. 387–389.CrossRefGoogle Scholar
  17. 17.
    Chiba, A., Kitamura, K., and Ogawa, T., Surf. Coat. Technol., 1986, vol. 27, no. 1, pp. 83–88.CrossRefGoogle Scholar
  18. 18.
    O’Reilly, C., Hinds, G., and Coey, J.M.D., J. Electrochem. Soc., 2001, vol. 148, pp. 674–678.CrossRefGoogle Scholar
  19. 19.
    Jianfeng, Z., Qichi, L., and Jianzhong, C., Acta Metall., 2013, vol. 49, pp. 101–106.CrossRefGoogle Scholar
  20. 20.
    Wang, L., Shen, J., Yin, X., Du, Y., Xiong, Y., and Fu, H., J. Appl. Phys., 2013, vol. 112, pp. 363–370.CrossRefGoogle Scholar
  21. 21.
    Chiba, A., Hosokava, A., and Ogava, T., Surf. Coat. Technol., 1986, vol. 27, no. 2, pp. 131–136.CrossRefGoogle Scholar
  22. 22.
    Knoepfel, H., Pulsed High Magnetic Fields: Physical Effects and Generation Methods Concerning Pulsed Fields up to the Megaoersted Level, Amsterdam: North-Holland, 1970, pp. 16–19.Google Scholar
  23. 23.
    GOST (State Standard) 9.302-88: Unified System of Corrosion and Ageing Protection. Metal and Non-Metal Inorganic Coatings. Control Methods, Moscow: Izd. Standartov, 1990.Google Scholar
  24. 24.
    Khimicheskaya entsiklopediya (Chemical Encyclopedia), Moscow: Bol’shaya Sov. Entsiklopediya, 1992, vol. 3, pp. 382–383.Google Scholar

Copyright information

© Allerton Press, Inc. 2018

Authors and Affiliations

  • S. V. Kovalyov
    • 1
    Email author
  • O. B. Girin
    • 1
  • C. Debiemme-Chouvy
    • 2
  1. 1.Ukrainian State University of Chemical TechnologyDniproUkraine
  2. 2.Sorbonne Universités, Laboratoire Interfaces et Systèmes Electrochimiques, CNRSParisFrance

Personalised recommendations