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Bulletin of the Lebedev Physics Institute

, Volume 45, Issue 11, pp 353–355 | Cite as

Effect of Laser Exposure on the Process of Silicon Nanoparticle Fabrication

  • I. N. Saraeva
  • A. K. Ivanova
  • S. I. Kudryashov
  • A. A. Nastulyavichus
Article
  • 15 Downloads

Abstract

Silicon nanoparticles are obtained by nanosecond laser ablation of a single-crystal wafer under a deionized water layer. Nanoparticle generation mechanisms are studied depending on the incident energy density of laser radiation (7–12 J/cm2) and scanning speed (10–750 mm/s). At a scanning speed of 150–200 mm/s, a maximum of the extinction coefficient of obtained colloidal solutions of nanoparticles is observed, which can be caused by an increase in their mass yield.

Keywords

laser ablation silicon nanoparticles 

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Copyright information

© Allerton Press, Inc. 2018

Authors and Affiliations

  • I. N. Saraeva
    • 1
  • A. K. Ivanova
    • 1
    • 2
  • S. I. Kudryashov
    • 1
    • 3
  • A. A. Nastulyavichus
    • 1
  1. 1.Lebedev Physical InstituteRussian Academy of SciencesMoscowRussia
  2. 2.National Research Nuclear University “MEPhI”MoscowRussia
  3. 3.National Research University of Information Technologies, Mechanics and OpticsSt. PetersburgRussia

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