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Emission Characteristics of Cu in Dc Voltage Modulation Applied Glow Discharge Optical Emission Spectrometry

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Abstract

In order to obtain the depth profile of a thin film, we investigated the emission characteristics of a voltage modulation glow discharge to optimize the modulation parameters (modulation voltage, offset voltage, and modulation frequency). In this study, a phase-sensitive detection method with a lock-in amplifier to the modulation technique led to a higher sensitivity and a larger signal-to-noise ratio in the emission analysis compared to the normal dc amplification method. Upon increasing the maximum voltage, the emission intensity of the Cu atomic line (CuI 239.34 nm) increased linearly at a modulation voltage of 400 V and an offset voltage of 300 V. On the other hand, the emission intensity was gradually reduced when a modulation frequency increased. It is advantageous for surface analysis that the voltage modulation technique gives a lower sputtering rate rather than the conventional dc discharge.

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References

  1. K. Marcus and J. A. C. Broekaert (ed.), “Glow Discharge Plasmas in Analytical Spectroscopy”, 2003, John Wiley & Sons, Chichester.

    Google Scholar 

  2. K. Wagatsuma, Surf. Interface Anal., 1999, 27, 63.

    Article  CAS  Google Scholar 

  3. E. Oxley, C. Yang, and W. W. Harrison, J. Anal. At. Spectrom., 2000, 15, 1241.

    Article  CAS  Google Scholar 

  4. V. D. Hodoroaba, W. E. S. Unger, H. Jenett, V. Hoffmann, B. Hagenhoff, S. Kayser, and K. Wetzig, Appl. Surf. Sci., 2001, 179, 30.

    Article  CAS  Google Scholar 

  5. J. Michler, M. Aeberhard, D. Velten, S. Winter, R. Payling, and J. Breme, Thin Solid Films, 2004, 447-448, 278.

    Article  CAS  Google Scholar 

  6. ISO 18115:2001(E), 47.

  7. S. Oswald and S. Baunack, Thin Solid Films, 2003, 425, 9.

    Article  CAS  Google Scholar 

  8. R. Payling, D. G. Jones, and A. Bengtson, “Glow Discharge Optical Emission Spectrometry”, 1997, John Wiley & Sons, England.

    Google Scholar 

  9. J. Angeli, A. Bengtson, A. Bogaerts, V. Hoffmann, V. D. Hodoroaba, and E. Steers, J. Anal. At. Spectrom., 2003, 18, 670.

    Article  CAS  Google Scholar 

  10. V. Hoffmann, R. Dorka, L. Wilken, V. D. Hodoroaba, and K. Wetzig, Surf. Interface Anal., 2003, 35, 575.

    Article  CAS  Google Scholar 

  11. K. Wagatsuma, ISIJ Int., 2000, 42, 783.

    Article  Google Scholar 

  12. K. Wagatsuma, K. Kodama, and H. Park, Anal. Chim. Acta, 2004, 502, 257.

    Article  CAS  Google Scholar 

  13. K. Wagatsuma and K. Hirokawa, Anal. Chem., 1984, 56, 2732.

    Article  CAS  Google Scholar 

  14. K. Wagatsuma and K. Hirokawa, Spectrochim. Acta, 1996, 51B, 349.

    Article  CAS  Google Scholar 

  15. H. Park and K. Wagatsuma, in Proceedings of the CAMP Report of the ISIJ Meeting, 2005, 18, 648.

    Google Scholar 

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Authors and Affiliations

  1. Institute for Materials Research, Tohoku University, Katahira 2-1-1, Sendai, 980-8577, Japan

    Hyunkook Park & Kazuaki Wagatsuma

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  1. Hyunkook Park
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  2. Kazuaki Wagatsuma
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Correspondence to Hyunkook Park.

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Park, H., Wagatsuma, K. Emission Characteristics of Cu in Dc Voltage Modulation Applied Glow Discharge Optical Emission Spectrometry. ANAL. SCI. 22, 599–602 (2006). https://doi.org/10.2116/analsci.22.599

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  • DOI: https://doi.org/10.2116/analsci.22.599

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